Patents by Inventor Syouzi Mochizuki

Syouzi Mochizuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for removing resist from semiconductor device
    Patent number: 4789427
    Abstract: A method for removing a resist on a layer formed on a semiconductor substrate includes the steps of removing a portion of the resist by plasma processing and removing the remaining resist by a chemical process.This method prevents the entry of heavy metal particles contained in the resist into the semiconductor substrate, so that a functional region formed in the semiconductor substrate is not contaminated by the heavy metal particles. As a result, destruction of the functional elements formed in the functional region is prevented, and thus the minority carrier generation lifetime in the device is not reduced.
    Type: Grant
    Filed: May 19, 1987
    Date of Patent: December 6, 1988
    Assignee: Fujitsu Limited
    Inventors: Shuzo Fujimura, Yoshikazu Kato, Syouzi Mochizuki