Patents by Inventor Syuji Fujimori

Syuji Fujimori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrode plate for plasma processing apparatus and method for regenerating electrode plate for plasma processing apparatus
    Patent number: 11133156
    Abstract: According to the present invention, an electrode plate for a plasma processing apparatus is provided, which includes an air hole through which a gas for plasma generation passes, the electrode plate for a plasma processing apparatus including: a base; and a coating layer provided on at least one front surface of the base, and in which the base is formed of a material having a plasma resistance higher than the plasma resistance of a material forming the coating layer.
    Type: Grant
    Filed: February 14, 2018
    Date of Patent: September 28, 2021
    Assignee: MITSUBISHI MATERIALS CORPORATION
    Inventors: Satoshi Nomura, Syuji Fujimori
  • ELECTRODE PLATE FOR PLASMA PROCESSING APPARATUS AND METHOD FOR REGENERATING ELECTRODE PLATE FOR PLASMA PROCESSING APPARATUS
    Publication number: 20200043707
    Abstract: According to the present invention, an electrode plate for a plasma processing apparatus is provided, which includes an air hole through which a gas for plasma generation passes, the electrode plate for a plasma processing apparatus including: a base; and a coating layer provided on at least one front surface of the base, and in which the base is formed of a material having a plasma resistance higher than the plasma resistance of a material forming the coating layer.
    Type: Application
    Filed: February 14, 2018
    Publication date: February 6, 2020
    Inventors: Satoshi Nomura, Syuji Fujimori