Abstract: A panel structure is provided in which a dielectric layer having no voids thereinside can be formed by a vapor deposition method. A layered film of plural metal layers that constitute an electrode covered with a dielectric layer is formed to have a stepped shape in which a width is smaller from a bottom layer to an uppermost layer for each layer in order. The stepped shape is formed by projecting an edge portion of a lower layer by design compared to an upper layer.

Abstract: A method for manufacturing a plasma display panel including a dielectric layer that is formed by a vapor deposition method and covers electrodes except their terminal portions, includes the steps of depositing a dielectric on a substrate on which each of the electrodes having a terminal portion at an end is arranged by a vapor deposition method so that the dielectric forms a layer for covering the electrodes over the entire length thereof, and removing a portion of the layer formed by the vapor deposition method that covers the terminal portions of the electrodes by a polishing method in which a polishing rate of the portion is larger than that of the terminal portion or by a dry etching method.