Patents by Inventor Syun-Jie Jhan

Syun-Jie Jhan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for electromagnetic interference shielding for critical dimension-scanning electron microscope
    Patent number: 8952330
    Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: February 10, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chi Tsao, Syun-Jie Jhan, Yi-Cheng Shih, Chwen Yu
  • System And Method For Electromagnetic Interference Shielding For Critical Dimension-Scanning Electron Microscope
    Publication number: 20140124667
    Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
    Type: Application
    Filed: January 17, 2014
    Publication date: May 8, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chi Tsao, Syun-Jie Jhan, Yi-Cheng Shih, Chwen Yu
  • System and method for electromagnetic interference shielding for critical dimension-scanning electron microscope
    Patent number: 8633439
    Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
    Type: Grant
    Filed: July 1, 2011
    Date of Patent: January 21, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chi Tsao, Syun-Jie Jhan, Yi-Cheng Shih, Chwen Yu
  • SYSTEM AND METHOD FOR ELECTROMAGNETIC INTERFERECE SHIELDING FOR CRITICAL DIMENSION-SCANNING ELECTRON MICROSCOPE
    Publication number: 20130001419
    Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
    Type: Application
    Filed: July 1, 2011
    Publication date: January 3, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chia-Chi Tsao, Syun-Jie Jhan, Yi-Cheng Shih, Chwen Yu