Patents by Inventor Syungaku Nakamura

Syungaku Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040174422
    Abstract: Provision of an inkjet recording cloth that can be inkjet-printed using a pigment ink at a high shade depth and having excellent water and abrasion resistance without deterioration in its characteristic handling touch, a method of preparing such an inkjet recording cloth and a method of inkjet-printing the cloth. Application of an acidic solution containing a certain hydrophobic low molecular weight compound, whose melting or softening point is from 40° C. to 150° C., to a cloth forms an ink-accepting layer on the surface of the cloth before inkjet-printing it with pigment ink. Preferably, said ink-accepting layer contains a cationic resin which shows an electrical conductivity of 0.5 mS/cm to 10.0 mS/cm when dissolved in water at a concentration of 1%, and has a number average molecular weight of 1,000 to 50,000.
    Type: Application
    Filed: March 22, 2004
    Publication date: September 9, 2004
    Applicant: Seiren Co., Ltd.
    Inventors: Syungaku Nakamura, Ayumi Yamazaki
  • Patent number: 6371610
    Abstract: An ink-jet printing method of applying an ink containing dyes onto cloth without need for a subsequent step of washing the cloth to produce printed cloth excellent in water, weather and abrasion resistance and dye-specific color brilliancy as well as soft to the touch. In the ink-jet printing method, the cloth is treated with an ink acceptor solution containing an ink holding agent and a synthetic resin having a glass transition temperature from 60 to 150° C. before it is subjected to ink-jet printing and then wet-heat treatment.
    Type: Grant
    Filed: January 28, 2000
    Date of Patent: April 16, 2002
    Assignee: Seiren Co., Ltd.
    Inventors: Syungaku Nakamura, Naohiro Oobayashi, Akiyo Nomura