Patents by Inventor Syunichi Seki

Syunichi Seki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6696225
    Abstract: A method of manufacturing a substrate with a pattern showing hydrophilic property formed on a pattern surface comprising the steps of applying a silane coupling agent to the pattern surface of the base and forming a silane coupling film, forming a mask conforming to the pattern to be provided on the silane coupling film, and activating the silane coupling film provided with the mask by applying energy thereto in order to generate a polar group. In the regions where masking could not be performed, a polar group such as the hydroxyl group, carboxyl group, amino group, or amino carboxyl group is generated and shows hydrophilic property. The masked regions comprise hydrophobic property. This substrate functions as a universal substrate suitable for forming patterns with the inkjet system.
    Type: Grant
    Filed: July 16, 1999
    Date of Patent: February 24, 2004
    Assignee: Seiko Epson Corporation
    Inventors: Sadao Kanbe, Hitoshi Fukushima, Hiroshi Kiguchi, Syunichi Seki