Abstract: Disclosed is an epoxy resin composition comprising: (A) a polymerized compound including, as structural components, phosphaphenanthrene and at least one constituent selected from a structural unit of a phenolic novolak polymer and a structural unit of a phenolic novolak polymer in which a hydrogen atom of a phenolic hydroxyl group is substituted by phosphaphenanthrene; (B) an epoxy resin having two or more epoxy groups in a molecule; and (C) a curing agent that cures the epoxy resin.

Abstract: A pattern is formed by an imprint technique, without decreases in throughput and alignment precision. A pattern forming apparatus includes a substrate holder that holds a substrate to be processed, a template holder that holds a template, a first position measuring device that measures the position of the substrate held by the substrate holder, a second position measuring device that measures the position of the template held by the template holder, and a control device that aligns the substrate with the template, based on transfer position information, calculates misalignments of the substrate and the template caused by a demolding procedure, based on the results of the measurement carried out by the first position measuring device and the second position measuring device, calculates a relative misalignment between the substrate and the template, based on the misalignments of the substrate and the template, and corrects the transfer position information, using the relative misalignment.