Patents by Inventor Syuuichi Ueno

Syuuichi Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor device, method of manufacturing the same and exposure mask for implantation
    Patent number: 6600180
    Abstract: A semiconductor device suppressing increase of the number of types of exposure mask for implantations, preventing complication of manufacturing steps and suppressing the manufacturing cost and manufacturing steps therefor are provided. An impurity implantation region (R81) is formed by first implantation with an exposure mask for implantation having an opening at the lower right and this exposure mask for implantation is turned over for forming another impurity implantation region (R82) by second implantation, thereby forming three types of impurity implantation regions including the impurity implantation region (R81) formed through the first implantation, the impurity implantation region (R82) formed through the second implantation and still another impurity implantation region (R83) formed through the first implantation and the second implantation. Four types of regions inclusive of a region (R84) not subjected to impurity implantation can be formed with a single type of exposure mask for implantation.
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: July 29, 2003
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Syuuichi Ueno, Tomohiro Yamashita, Hirokazu Sayama