Patents by Inventor Syuusei Matsuda

Syuusei Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10457788
    Abstract: A gas-barrier multilayer film, wherein (A) a first inorganic thin film layer, (C) a gas-barrier resin composition layer, and (D) a second inorganic thin film layer are stacked in this order with or without intervention of other layers on at least one surface of a plastic film, the gas-barrier resin composition layer (C) is formed from a gas-barrier resin composition comprising (a) a gas-barrier resin including an ethylene-vinyl alcohol-based copolymer, (b) an inorganic layered compound, and (c) at least one additive selected from coupling agents and crosslinking agents, and the content of the inorganic layered compound (b) in the gas-barrier resin composition is from 0.1% by mass to 20% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c).
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: October 29, 2019
    Assignee: TOYO BOSEKI KABUSHIKI KAISHA
    Inventors: Yumi Tsumagari, Yoji Takatsu, Kyoko Inagaki, Takeshi Okawa, Yoshiharu Morihara, Syuusei Matsuda
  • Patent number: 9605122
    Abstract: Provided is a gas-barrier multilayer film which decreases little in gas-barrier properties even through retortion and which suffers no delamination. The gas-barrier multilayer film is characterized by comprising a plastic film and, superposed directly or through other layer on at least one surface thereof in the following order, an inorganic thin film layer and a gas-barrier resin composition layer. The gas-barrier film is further characterized in that the gas-barrier resin composition layer has been formed from a gas-barrier resin composition comprising a gas-barrier resin constituted of an ethylene/vinyl alcohol copolymer, an inorganic lamellar compound, and an additive, that the content of the inorganic lamellar compound in the gas-barrier resin composition is 0.1-9.0 mass %, that the additive is a coupling agent and/or a crosslinking agent, and that the gas-barrier resin composition layer has a thickness of 0.05-0.5 ?m.
    Type: Grant
    Filed: July 27, 2010
    Date of Patent: March 28, 2017
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Youji Takatsu, Yumi Tsumagari, Takeshi Ookawa, Yoshiharu Morihara, Syuusei Matsuda
  • Publication number: 20120270058
    Abstract: Provided is a gas-barrier multilayer film which is superior in gas-barrier properties and interlayer adhesion property, and which exhibits less deterioration in gas-barrier properties and is resistant to interlayer delamination even in prolonged exposure to a high-temperature and high-humidity environment or after a retort treatment. A gas-barrier multilayer film, wherein (A) a first inorganic thin film layer, (C) a gas-barrier resin composition layer, and (D) a second inorganic thin film layer are stacked in this order with or without intervention of other layers on at least one surface of a plastic film, the gas-barrier resin composition layer (C) is formed from a gas-barrier resin composition comprising (a) a gas-barrier resin including an ethylene-vinyl alcohol-based copolymer, (b) an inorganic layered compound, and (c) at least one additive selected from coupling agents and crosslinking agents, and the content of the inorganic layered compound (b) in the gas-barrier resin composition is from 0.
    Type: Application
    Filed: December 22, 2010
    Publication date: October 25, 2012
    Applicant: TOYO BOSEKI KABUSHIKI KAISHA
    Inventors: Yumi Tsumagari, Yoji Takatsu, Kyoko Inagaki, Takeshi Okawa, Yoshiharu Morihara, Syuusei Matsuda
  • Publication number: 20120128956
    Abstract: Provided is a gas-barrier multilayer film which decreases little in gas-barrier properties even through retortion and which suffers no delamination. The gas-barrier multilayer film is characterized by comprising a plastic film and, superposed directly or through other layer on at least one surface thereof in the following order, an inorganic thin film layer and a gas-barrier resin composition layer. The gas-barrier film is further characterized in that the gas-barrier resin composition layer has been formed from a gas-barrier resin composition comprising a gas-barrier resin constituted of an ethylene/vinyl alcohol copolymer, an inorganic lamellar compound, and an additive, that the content of the inorganic lamellar compound in the gas-barrier resin composition is 0.1-9.0 mass %, that the additive is a coupling agent and/or a crosslinking agent, and that the gas-barrier resin composition layer has a thickness of 0.05-0.5 ?m.
    Type: Application
    Filed: June 27, 2010
    Publication date: May 24, 2012
    Applicant: TOYO BOSEKI KABUSHIKI KAISHA
    Inventors: Youji Takatsu, Yumi Tsumagari, Takeshi Ookawa, Yoshiharu Morihara, Syuusei Matsuda