Patents by Inventor T. Crkvenac

T. Crkvenac has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing pad having a pressure relief channel
    Publication number: 20050281983
    Abstract: The present invention provides a chemical mechanical polishing pad comprising a window formed in the polishing pad, the window having a void provided on a side thereof. The polishing pad further comprises a void-pressure relief channel provided in the polishing pad from the void to a periphery of the polishing pad.
    Type: Application
    Filed: June 16, 2004
    Publication date: December 22, 2005
    Inventors: T. Crkvenac, Robert Gamble, Jason Lawhorn
  • Porous polyurethane polishing pads
    Publication number: 20050026552
    Abstract: A porous polishing pad is useful for polishing semiconductor substrates. The porous polishing pad has a porous matrix formed from a coagulated polyurethane and a non-fibrous polishing layer. The non-fibrous polishing layer has a polishing surface with a pore count of at least 500 pores per mm2 that decreases with removal of the polishing layer; and the polishing surface has a surface roughness Ra between 0.01 and 3 ?m.
    Type: Application
    Filed: July 30, 2003
    Publication date: February 3, 2005
    Inventors: Clyde Fawcett, T. Crkvenac, Kenneth Prygon, Bernard Foster