Abstract: Semiconductor structures are provided. The semiconductor structure includes a substrate and nanostructures formed over the substrate. In addition, the nanostructures includes channel regions and source/drain regions. The semiconductor structure further includes a gate structure vertically sandwiched the channel regions of the nanostructures and a contact wrapping around and vertically sandwiched between the source/drain regions of the nanostructures.

Abstract: Semiconductor structures are provided. The semiconductor structure includes a substrate and nanostructures formed over the substrate. The semiconductor structure further includes a gate structure surrounding the nanostructures and a source/drain structure attached to the nanostructures. The semiconductor structure further includes a contact formed over the source/drain structure and extending into the source/drain structure.

Abstract: A compact two-stage granular moving-bed apparatus comprises a vessel, a flow-corrective element, and a filter material supplying part. The vessel comprises a hollow interior, a gas outlet, a first media outlet and a second media outlet. The flow-corrective element divides the hollow interior into a first channel and a second channel. The filter material supplying part has a first provider for providing a first granular material flowing through the first channel and a second provider for providing a second granular material flowing through the second channel, wherein a vertical level of each first and second provider is adjustable so that a first flow path that an exhaust gas flows through the first granular material and a second flow path that the exhaust gas flow through the second granular material is respectively capable of being controlled.

Abstract: A compact two-stage granular moving-bed apparatus comprises a vessel, a flow-corrective element, and a filter material supplying part. The vessel comprises a hollow interior, a gas outlet, a first media outlet and a second media outlet. The flow-corrective element divides the hollow interior into a first channel and a second channel. The filter material supplying part has a first provider for providing a first granular material flowing through the first channel and a second provider for providing a second granular material flowing through the second channel, wherein a vertical level of each first and second provider is adjustable so that a first flow path that an exhaust gas flows through the first granular material and a second flow path that the exhaust gas flow through the second granular material is respectively capable of being controlled.