Abstract: The present disclosure describes a method for controlling radiation conditions and an example system for performing the method. The method includes sending a first setting to configure a radiation device to provide radiation to a substrate undergoing a process operation in a process chamber of the radiation device. The method further includes receiving radiation energy data measured at a plurality of locations of the process chamber and receiving measurement data measured on the substrate during the process operation. The method further includes in response to a variance of the radiation energy data being above a first predetermined threshold and in response to a difference between reference data and the measurement data being above a second predetermined threshold, sending a second setting to configure the radiation device to provide radiation to the substrate.

Abstract: A bicycle pedal includes a rotation axle; a pedal body movably coupled to the rotation axle and including an axle sleeve section, two hollowed areas, and a first retention block assembly and a second retention block assembly; first and second adjustment mechanisms respectively arranged in the hollowed areas and each including a fixing bolt arranged in the hollowed area, a holding seat fit over the fixing bolt and abutting one side of the first or second retention block assembly, an elastic element fit over the fixing bolt and having an end abutting one side of the second or first retention block assembly, and an adjustment section movably mounted to the holding seat and abutting an opposite end of the elastic element; and a clip block mounted, in a removable manner, between the first adjustment mechanism and the second adjustment mechanism.

Abstract: A bicycle pedal assembly includes a pedal forming in a central portion thereof a hollow portion; an axle unit movably received in the hollow portion and including a central axle and self-lubricating bearings fit to the central axle and respectively located at opposite ends of the hollow portion; and an abrasion resistant unit mounted to an end of the central axle. As such, the axle unit is coupled to a bicycle, so that when a rider applies a force to the pedal for pedaling operation, the abrasion resistant unit helps protecting the pedal from abrasion and wear induced by direct contact and thereby extends the life space.

Abstract: A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.

Abstract: A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.