Patents by Inventor Ta-Kang Lo

Ta-Kang Lo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250151384
    Abstract: A manufacturing method of a semiconductor device includes the following steps. A III-V compound semiconductor layer is formed on a first device region and a second device region of a substrate. A III-V compound barrier layer is formed on the III-V compound semiconductor layer. A lamination structure is formed on the III-V compound barrier layer. The lamination structure includes a p-type doped III-V compound layer and a first mask layer disposed thereon. A patterning process is performed to the lamination structure. A first portion of the lamination structure located above the first device region is patterned by the patterning process. A second portion of the lamination structure located above the second device region is removed by the patterning process. A thickness of the second portion of the lamination structure is greater than a thickness of the first portion of the lamination structure before the patterning process.
    Type: Application
    Filed: December 14, 2023
    Publication date: May 8, 2025
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Shuo-Lin Hsu, Hung-Chang Chang, Ta-Kang Lo, Tsai-Fu Chen
  • Patent number: 12283637
    Abstract: A MOS capacitor includes a substrate having a capacitor forming region thereon, an ion well having a first conductivity type in the substrate, a counter doping region having a second conductivity type in the ion well within the capacitor forming region, a capacitor dielectric layer on the ion well within the capacitor forming region, a gate electrode on the capacitor dielectric layer, a source doping region having the second conductivity type on a first side of the gate electrode within the capacitor forming region, and a drain doping region having the second conductivity type on a second side of the gate electrode within the capacitor forming region.
    Type: Grant
    Filed: October 31, 2022
    Date of Patent: April 22, 2025
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Jian-Li Lin, Wei-Da Lin, Cheng-Guo Chen, Ta-Kang Lo, Yi-Chuan Chen, Huan-Chi Ma, Chien-Wen Yu, Kuan-Ting Lu, Kuo-Yu Liao
  • Patent number: 12278282
    Abstract: A high-electron mobility transistor includes a substrate, a gate electrode, a drain electrode, a source electrode and a first field plate. The substrate includes an active region. The gate electrode is disposed on the substrate. The drain electrode is disposed at one side of the gate electrode. The source electrode is disposed at another side of the gate electrode. The first field plate is electrically connected with the source electrode and extends from the source electrode toward the drain electrode. An overlapping area of the first field plate and the gate electrode is smaller than an overlapping area of the gate electrode and the active region.
    Type: Grant
    Filed: May 11, 2022
    Date of Patent: April 15, 2025
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Jian-Li Lin, Cheng-Guo Chen, Ta-Kang Lo, Cheng-Han Wu
  • Patent number: 12100756
    Abstract: A high electron mobility transistor (HEMT) device including a substrate, a channel layer, a barrier layer, a p-type gallium nitride (GaN) spacer, a gate electrode, a source electrode, and a drain electrode is provided. The channel layer is disposed on the substrate. The barrier layer is disposed on the channel layer and has a protruding portion. The P-type GaN spacer is disposed on a side wall of the protruding portion. The gate electrode is disposed on the protruding portion and the P-type GaN spacer. The source electrode and the drain electrode are disposed on two sides of the gate electrode.
    Type: Grant
    Filed: November 16, 2021
    Date of Patent: September 24, 2024
    Assignee: United Microelectronics Corp.
    Inventors: Hao-Ming Lee, Ta Kang Lo, Tsai-Fu Chen, Shou-Wei Hsieh
  • Publication number: 20230335630
    Abstract: A high-electron mobility transistor includes a substrate, a gate electrode, a drain electrode, a source electrode and a first field plate. The substrate includes an active region. The gate electrode is disposed on the substrate. The drain electrode is disposed at one side of the gate electrode. The source electrode is disposed at another side of the gate electrode. The first field plate is electrically connected with the source electrode and extends from the source electrode toward the drain electrode. An overlapping area of the first field plate and the gate electrode is smaller than an overlapping area of the gate electrode and the active region.
    Type: Application
    Filed: May 11, 2022
    Publication date: October 19, 2023
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Jian-Li Lin, Cheng-Guo Chen, Ta-Kang Lo, Cheng-Han Wu
  • Publication number: 20230129579
    Abstract: A high electron mobility transistor (HEMT) device including a substrate, a channel layer, a barrier layer, a p-type gallium nitride (GaN) spacer, a gate electrode, a source electrode, and a drain electrode is provided. The channel layer is disposed on the substrate. The barrier layer is disposed on the channel layer and has a protruding portion. The P-type GaN spacer is disposed on a side wall of the protruding portion. The gate electrode is disposed on the protruding portion and the P-type GaN spacer. The source electrode and the drain electrode are disposed on two sides of the gate electrode.
    Type: Application
    Filed: November 16, 2021
    Publication date: April 27, 2023
    Applicant: United Microelectronics Corp.
    Inventors: Hao-Ming Lee, Ta Kang Lo, Tsai-Fu Chen, Shou-Wei Hsieh
  • Publication number: 20230048684
    Abstract: A MOS capacitor includes a substrate having a capacitor forming region thereon, an ion well having a first conductivity type in the substrate, a counter doping region having a second conductivity type in the ion well within the capacitor forming region, a capacitor dielectric layer on the ion well within the capacitor forming region, a gate electrode on the capacitor dielectric layer, a source doping region having the second conductivity type on a first side of the gate electrode within the capacitor forming region, and a drain doping region having the second conductivity type on a second side of the gate electrode within the capacitor forming region.
    Type: Application
    Filed: October 31, 2022
    Publication date: February 16, 2023
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Jian-Li Lin, Wei-Da Lin, Cheng-Guo Chen, Ta-Kang Lo, Yi-Chuan Chen, Huan-Chi Ma, Chien-Wen Yu, Kuan-Ting Lu, Kuo-Yu Liao
  • Publication number: 20220181505
    Abstract: A MOS capacitor includes a substrate having a capacitor forming region thereon, an ion well having a first conductivity type in the substrate, a counter doping region having a second conductivity type in the ion well within the capacitor forming region, a capacitor dielectric layer on the ion well within the capacitor forming region, a gate electrode on the capacitor dielectric layer, a source doping region having the second conductivity type on a first side of the gate electrode within the capacitor forming region, and a drain doping region having the second conductivity type on a second side of the gate electrode within the capacitor forming region.
    Type: Application
    Filed: January 11, 2021
    Publication date: June 9, 2022
    Inventors: Jian-Li Lin, Wei-Da Lin, Cheng-Guo Chen, Ta-Kang Lo, Yi-Chuan Chen, Huan-Chi Ma, Chien-Wen Yu, Kuan-Ting Lu, Kuo-Yu Liao
  • Patent number: 10707305
    Abstract: A tunneling transistor and a method of fabricating the same, the tunneling transistor includes a fin shaped structure, a source structure and a drain structure, and a gate structure. The fin shaped structure is disposed in a substrate, and the source structure and the drain structure are disposed the fin shaped structure, wherein an entirety of the source structure and an entirety of the drain structure being of complementary conductivity types with respect to one another and having different materials. A channel region is disposed in the fin shaped structure between the source structure and the drain structure and the gate structure is disposed on the channel region. That is, a hetero tunneling junction is vertically formed between the channel region and the source structure, and between the channel region and the drain structure in the fin shaped structure.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: July 7, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Cheng-Guo Chen, Kun-Yuan Wu, Tai-You Chen, Chiu-Sheng Ho, Po-Kang Yang, Ta-Kang Lo
  • Patent number: 10607891
    Abstract: A manufacturing method of a semiconductor device includes following steps. First gate structures and second gate structures are formed on a first region and a second region of a semiconductor substrate respectively. A spacing distance between the second gate structures is larger than that between the first gate structures. A first ion implantation is preformed to form a first doped region between the first gate structures. A second ion implantation is performed to form a second doped region between the second gate structures. A tilt angle of the second ion implantation is larger than that of the first ion implantation. An implantation dose of the second ion implantation is lower than that of the first ion implantation. An etching process is performed to at least partially remove the first doped region to form a first recess and at least partially remove the second doped region to form a second recess.
    Type: Grant
    Filed: November 6, 2017
    Date of Patent: March 31, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Jiun-Lin Yeh, Hsueh-Chih Tseng, Chia-Chen Tsai, Ta-Kang Lo
  • Publication number: 20190214463
    Abstract: A tunneling transistor and a method of fabricating the same, the tunneling transistor includes a fin shaped structure, a source structure and a drain structure, and a gate structure. The fin shaped structure is disposed in a substrate, and the source structure and the drain structure are disposed the fin shaped structure, wherein an entirety of the source structure and an entirety of the drain structure being of complementary conductivity types with respect to one another and having different materials. A channel region is disposed in the fin shaped structure between the source structure and the drain structure and the gate structure is disposed on the channel region. That is, a hetero tunneling junction is vertically formed between the channel region and the source structure, and between the channel region and the drain structure in the fin shaped structure.
    Type: Application
    Filed: March 14, 2019
    Publication date: July 11, 2019
    Inventors: Cheng-Guo Chen, Kun-Yuan Wu, Tai-You Chen, Chiu-Sheng Ho, Po-Kang Yang, Ta-Kang Lo
  • Patent number: 10276663
    Abstract: A tunneling transistor and a method of fabricating the same, the tunneling transistor includes a fin shaped structure, a source structure and a drain structure, and a gate structure. The fin shaped structure is disposed in a substrate, and the source structure and the drain structure are disposed the fin shaped structure, wherein an entirety of the source structure and an entirety of the drain structure being of complementary conductivity types with respect to one another and having different materials. A channel region is disposed in the fin shaped structure between the source structure and the drain structure and the gate structure is disposed on the channel region. That is, a hetero tunneling junction is vertically formed between the channel region and the source structure, and between the channel region and the drain structure in the fin shaped structure.
    Type: Grant
    Filed: July 18, 2016
    Date of Patent: April 30, 2019
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Cheng-Guo Chen, Kun-Yuan Wu, Tai-You Chen, Chiu-Sheng Ho, Po-Kang Yang, Ta-Kang Lo
  • Publication number: 20190115259
    Abstract: A manufacturing method of a semiconductor device includes following steps. First gate structures and second gate structures are formed on a first region and a second region of a semiconductor substrate respectively. A spacing distance between the second gate structures is larger than that between the first gate structures. A first ion implantation is preformed to form a first doped region between the first gate structures. A second ion implantation is performed to form a second doped region between the second gate structures. A tilt angle of the second ion implantation is larger than that of the first ion implantation. An implantation dose of the second ion implantation is lower than that of the first ion implantation. An etching process is performed to at least partially remove the first doped region to form a first recess and at least partially remove the second doped region to form a second recess.
    Type: Application
    Filed: November 6, 2017
    Publication date: April 18, 2019
    Inventors: Jiun-Lin Yeh, Hsueh-Chih Tseng, Chia-Chen Tsai, Ta-Kang Lo
  • Publication number: 20180122705
    Abstract: First, a substrate having a first region and a second region is provided, a first gate structure is formed on the first region and a second gate structure is formed on the second region, an interlayer dielectric (ILD) layer is formed around the first gate structure and the second gate structure, and the first gate structure and the second gate structure are removed to expose the substrate on the first region and the second region. Next, part of the substrate on the first region is removed to form a first recess and part of the substrate on the second region is removed to form a second recess, in which the depths of the first recess and the second recess are different. Next, a first metal gate is formed on the first region and a second metal gate is formed on the second region.
    Type: Application
    Filed: November 2, 2016
    Publication date: May 3, 2018
    Inventors: Tai-You Chen, Cheng-Guo Chen, Kun-Yuan Wu, Chiu-Sheng Ho, Po-Kang Yang, Ta-Kang Lo, Shang-Jr Chen
  • Patent number: 9960083
    Abstract: First, a substrate having a first region and a second region is provided, a first gate structure is formed on the first region and a second gate structure is formed on the second region, an interlayer dielectric (ILD) layer is formed around the first gate structure and the second gate structure, and the first gate structure and the second gate structure are removed to expose the substrate on the first region and the second region. Next, part of the substrate on the first region is removed to form a first recess and part of the substrate on the second region is removed to form a second recess, in which the depths of the first recess and the second recess are different. Next, a first metal gate is formed on the first region and a second metal gate is formed on the second region.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: May 1, 2018
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Tai-You Chen, Cheng-Guo Chen, Kun-Yuan Wu, Chiu-Sheng Ho, Po-Kang Yang, Ta-Kang Lo, Shang-Jr Chen
  • Publication number: 20180019341
    Abstract: A tunneling transistor and a method of fabricating the same, the tunneling transistor includes a fin shaped structure, a source structure and a drain structure, and a gate structure. The fin shaped structure is disposed in a substrate, and the source structure and the drain structure are disposed the fin shaped structure, wherein an entirety of the source structure and an entirety of the drain structure being of complementary conductivity types with respect to one another and having different materials. A channel region is disposed in the fin shaped structure between the source structure and the drain structure and the gate structure is disposed on the channel region. That is, a hetero tunneling junction is vertically formed between the channel region and the source structure, and between the channel region and the drain structure in the fin shaped structure.
    Type: Application
    Filed: July 18, 2016
    Publication date: January 18, 2018
    Inventors: Cheng-Guo Chen, Kun-Yuan Wu, Tai-You Chen, Chiu-Sheng Ho, Po-Kang Yang, Ta-Kang Lo
  • Patent number: 9779998
    Abstract: A method of manufacturing a semiconductor device is provided in the present invention. Multiple spacer layers are used in the invention to form spacers with different predetermined thickness on different active regions or devices, thus the spacing between the strained silicon structure and the gate structure (SiGe-to-Gate) can be properly controlled and adjusted to achieve better and more uniform performance for various devices and circuit layouts.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: October 3, 2017
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chia-Chen Tsai, Hung-Chang Chang, Ta-Kang Lo, Tsai-Fu Chen, Shang-Jr Chen
  • Publication number: 20170221766
    Abstract: A method of manufacturing a semiconductor device is provided in the present invention. Multiple spacer layers are used in the invention to form spacers with different predetermined thickness on different active regions or devices, thus the spacing between the strained silicon structure and the gate structure (SiGe-to-Gate) can be properly controlled and adjusted to achieve better and more uniform performance for various devices and circuit layouts.
    Type: Application
    Filed: March 6, 2017
    Publication date: August 3, 2017
    Inventors: Chia-Chen Tsai, Hung-Chang Chang, Ta-Kang Lo, Tsai-Fu Chen, Shang-Jr Chen
  • Patent number: 9685520
    Abstract: A manufacturing method of a semiconductor device includes the following steps. A first gate dielectric layer is formed in a first gate trench and a second gate dielectric layer is formed in a second gate trench. A first bottom barrier layer is formed on the first gate dielectric layer and the second gate dielectric layer. A first conductivity type work function layer is formed on the first bottom barrier layer. A first treatment to the first gate dielectric layer and/or a second treatment to the first bottom barrier layer on the first gate dielectric layer are performed before the step of forming the first conductivity type work function layer. The first treatment and the second treatment are used to modify threshold voltages of specific transistors, and thicknesses of work function layers formed subsequently may be modified for increasing the related process window accordingly.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: June 20, 2017
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Shuo-Lin Hsu, Hsin-Ta Hsieh, Chun-Chia Chen, Chen-Chien Li, Hung-Chang Chang, Ta-Kang Lo, Tsai-Fu Chen, Shang-Jr Chen
  • Patent number: 9634002
    Abstract: A semiconductor device and method of manufacturing the same are provided in the present invention. Multiple spacer layers are used in the invention to form spacers with different predetermined thickness on different active regions or devices, thus the spacing between the strained silicon structure and the gate structure (SiGe-to-Gate) can be properly controlled and adjusted to achieve better and more uniform performance for various devices and circuit layouts.
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: April 25, 2017
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chia-Chen Tsai, Hung-Chang Chang, Ta-Kang Lo, Tsai-Fu Chen, Shang-Jr Chen