Abstract: A clean bench providing a working space for technicians, in a clean room, to remove and trap particles from the surface of an object with a high-pressure spray gun or a vacuum suction unit. This clean bench has an isolated disposal working space to avoid the escape of particles from it; moreover, it conducts and traps them by the design of a particle-conducting basin and a fan-filter unit (FFU) in it.

Abstract: A semiconductor process apparatus and a SMIF pod used therein. The semiconductor process apparatus comprises a first support, a second support, and a SMIF pod. The first support includes a first pin and a first rotating device, and the first pin is rotated by the first rotating device in a first direction. The second support includes a second pin and a second rotating device, and the second pin is rotated by the second rotating device in a second direction opposite the first direction. The SMIF pod includes a base and a cover. The base includes a slot and an engaging member, and the cover defines a hole for the engaging member to be inserted into. The first pin is inserted into the slot when the SMIF pod is disposed on the first support, and the slot is rotated by the first pin in the first direction so that the engaging member is withdrawn from the hole.