Patents by Inventor Ta-Min Lin

Ta-Min Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7468321
    Abstract: A new method is provided for the processing of metals, most notably copper, such that damage to exposed surfaces of these metals is prevented. During a step of semiconductor processing, which results in exposing a metal surface to a wet substance having a pH value, a voltage is applied to the metal that is exposed. The value of the applied voltage can, dependent on the value of the pH constant of the wet substance, be selected such that the exposed metal surface is protected against alkaline effects of the wet substance.
    Type: Grant
    Filed: May 10, 2006
    Date of Patent: December 23, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Kai-Ming Ching, Chia-Fu Lin, Wen-Hsiang Tseng, Ta-Min Lin, Yen-Ming Chen, Hsin-Hui Lee, Chao-Yuan Su, Wen-Hsiang Tseng
  • Patent number: 7276454
    Abstract: A new method is provided for the processing of metals, most notably copper, such that damage to exposed surfaces of these metals is prevented. During a step of semiconductor processing, which results in exposing a metal surface to a wet substance having a pH value, a voltage is applied to the metal that is exposed. The value of the applied voltage can, dependent on the value of the pH constant of the wet substance, be selected such that the exposed metal surface is protected against alkaline effects of the wet substance.
    Type: Grant
    Filed: November 2, 2002
    Date of Patent: October 2, 2007
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Kai-Ming Ching, Chia Fu Lin, Wen-Hsiang Tseng, Ta-Min Lin, Yen-Ming Chen, Hsin-Hui Lee, Chao-Yuan Su, Li-Chih Chen
  • Publication number: 20060194407
    Abstract: A new method is provided for the processing of metals, most notably copper, such that damage to exposed surfaces of these metals is prevented. During a step of semiconductor processing, which results in exposing a metal surface to a wet substance having a pH value, a voltage is applied to the metal that is exposed. The value of the applied voltage can, dependent on the value of the pH constant of the wet substance, be selected such that the exposed metal surface is protected against alkaline effects of the wet substance.
    Type: Application
    Filed: May 10, 2006
    Publication date: August 31, 2006
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Kai-Ming Ching, Chia Lin, Wen-Hsiang Tseng, Ta-Min Lin, Yen-Ming Chen, Hsin-Hui Lee, Chao-Yuan Su, Wen-Hsiang Tseng
  • Patent number: 6918397
    Abstract: A flush system comprising a network of conduits, valves and screens that can be interposed between the process container and solvent re-claim tank components of a dry film photoresist (DFR) remover system, for example, that is used in the processing and packaging of integrated circuit chips. By operation of the valves in the flush system, DFR particles can be removed from the DFR remover system in order to prevent or minimize particle clogging of a particle filter in the DFR remover system. The screens in the flush system can be periodically cleaned by reverse flow of solvent or by operation of a nitrogen and DI (deionized) water purge system.
    Type: Grant
    Filed: April 22, 2002
    Date of Patent: July 19, 2005
    Assignee: Taiwan Semiconductor
    Inventors: Ta-Min Lin, Szu-Yao Wang, Chia-Fu Lin, Kai-Ming Ching, Wen-Hsiang Tseng
  • Patent number: 6797075
    Abstract: A Ferris wheel-like stripping or cleaning mechanism that can be used in semiconductor fabrication, such as in photoresist or other stripping, or wafer or other cleaning, is disclosed. A stripping mechanism can include a container to hold a chemical, such as a photoresist stripping chemical, a wafer cleaning chemical, or another type of chemical. The mechanism can also include a component to move semiconductor wafers through the chemical in the container in a Ferris wheel-like motion. The component may include wafer holders for the wafers that are swivably mounted about an axis of rotation. As the one or more wafer holders rotate about the axis of rotation through the chemical in the container, the wafer holders remain in a substantially constant vertical and horizontal orientation.
    Type: Grant
    Filed: May 9, 2002
    Date of Patent: September 28, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Kai-Ming Ching, Chia-Fu Lin, Wen-Hsiang Tseng, Ta-Min Lin, Yen-Ming Chen, Hsin-Hui Lee
  • Publication number: 20040087175
    Abstract: A new method is provided for the processing of metals, most notably copper, such that damage to exposed surfaces of these metals is prevented. During a step of semiconductor processing, which results in exposing a metal surface to a wet substance having a pH value, a voltage is applied to the metal that is exposed. The value of the applied voltage can, dependent on the value of the pH constant of the wet substance, be selected such that the exposed metal surface is protected against alkaline effects of the wet substance.
    Type: Application
    Filed: November 2, 2002
    Publication date: May 6, 2004
    Applicant: Taiwan Semiconductor Manufacturing Company
    Inventors: Kai-Ming Ching, Chia Fu Lin, Wen-Hsiang Tseng, Ta-Min Lin, Yen-Ming Chen, Hsin-Hui Lee, Chao-Yuan Su, Wen-Hsiang Tseng
  • Publication number: 20030209260
    Abstract: A Ferris wheel-like stripping or cleaning mechanism that can be used in semiconductor fabrication, such as in photoresist or other stripping, or wafer or other cleaning, is disclosed. A stripping mechanism can include a container to hold a chemical, such as a photoresist stripping chemical, a wafer cleaning chemical, or another type of chemical. The mechanism can also include a component to move semiconductor wafers through the chemical in the container in a Ferris wheel-like motion. The component may include wafer holders for the wafers that are swivably mounted about an axis of rotation. As the one or more wafer holders rotate about the axis of rotation through the chemical in the container, the wafer holders remain in a substantially constant vertical and horizontal orientation.
    Type: Application
    Filed: May 9, 2002
    Publication date: November 13, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Kai-Ming Ching, Chia-Fu Lin, Wen-Hsiang Tseng, Ta-Min Lin, Yen-Ming Chen, Hsin-Hui Lee
  • Publication number: 20030196684
    Abstract: A flush system comprising a network of conduits, valves and screens that can be interposed between the process container and solvent re-claim tank components of a dry film photoresist (DFR) remover system, for example, that is used in the processing and packaging of integrated circuit chips. By operation of the valves in the flush system, DFR particles can be removed from the DFR remover system in order to prevent or minimize particle clogging of a particle filter in the DFR remover system. The screens in the flush system can be periodically cleaned by reverse flow of solvent or by operation of a nitrogen and DI (deionized) water purge system.
    Type: Application
    Filed: April 22, 2002
    Publication date: October 23, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ta-Min Lin, Szu-Yao Wang, Chia-Fu Lin, Kai-Ming Ching, Wen-Hsiang Tseng