Patents by Inventor Ta Y. Ching

Ta Y. Ching has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030109643
    Abstract: Disclosed is a process for esterifying and/or transesterifying a polymer having a polyethylenic backbone and pendant acid and/or ester moieties comprising contacting a melt of the polymer with a transesterifying compound so that the polymer undergoes esterification and/or transesterification but not alcoholysis. The esterified or transesterified polymer also has pendant ester moieties which differ in kind and/or number from the unreacted polymer. In one embodiment, the process also comprises adding an amount of a transition metal salt that is effective to promote oxygen scavenging. Also in a further embodiment, the process comprises irradiating the transesterified polymer with actinic radiation to reduce the induction period before oxygen scavenging commences.
    Type: Application
    Filed: June 7, 1995
    Publication date: June 12, 2003
    Inventors: TA Y. CHING, KIYOSHI KATSUMOTO
  • Patent number: 5631328
    Abstract: Ionomer compositions which have improved optical properties are disclosed. These compositions comprise ionomers which can be represented as the polymerization product of alpha-olefins having from two to eight carbon atoms, esters of alpha, beta-ethylenically-unsaturated carboxylic acids, metal salts of acrylic and methacrylic acid, and optional alpha, beta-ethylenically-unsaturated comonomers which impart some desired polymer property or properties, such as acidity and/or solvent resistivity. Also disclosed are methods of making these ionomer compositions in a reactive extruder and treating the compositions with acid to impart acidity to the compositions or to only the surface of the compositions.
    Type: Grant
    Filed: January 27, 1995
    Date of Patent: May 20, 1997
    Assignee: Chevron Chemical Company
    Inventors: James H. Wang, David Rosendale, Victor P. Kurkov, Leslie P. Theard, Ta Y. Ching, Lewis R. Compton, Tor H. G. Palmgren, Mitchell P. Eichelberger
  • Patent number: 5627239
    Abstract: Disclosed is a process for esterifying and/or transesterifying a polymer having a polyethylenic backbone and pendant acid and/or ester moieties comprising contacting a melt of the polymer with a transesterifying compound so that the polymer undergoes esterification and/or transesterification but not alcoholysis. The esterified or transesterified polymer also has pendant ester moieties which differ in kind and/or number from the unreacted polymer. In one embodiment, the process also comprises adding an amount of a transition metal salt that is effective to promote oxygen scavenging. Also in a further embodiment, the process comprises irradiating the transesterified polymer with actinic radiation to reduce the induction period before oxygen scavenging commences.Also disclosed are compositions comprising a component which comprises an ethylenic or polyethylenic backbone and a pendant or terminal moiety comprising a benzylic, allylic, or ether-containing radical.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: May 6, 1997
    Assignee: Chevron Chemical Company
    Inventors: Ta Y. Ching, Kiyoshi Katsumoto, Steven P. Current, Leslie P. Theard
  • Patent number: 5599877
    Abstract: Ionomer compositions which have improved optical properties are disclosed. These compositions comprise ionomers which can be represented as the polymerization product of alpha-olefins having from two to eight carbon atoms, esters of alpha, beta-ethylenically-unsaturated carboxylic acids, metal salts of acrylic and methacrylic acid, and optional alpha, beta-ethylenically-unsaturated comonomers which impart some desired polymer property or properties, such as acidity and/or solvent resistivity. Also disclosed are methods of making these ionomer compositions in a reactive extruder and treating the compositions with acid to impart acidity to the compositions or to only the surface of the compositions.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: February 4, 1997
    Assignee: Chevron Chemical Company
    Inventors: James H. Wang, David Rosendale, Victor P. Kurkov, Leslie P. Theard, Ta Y. Ching, Lewis R. Compton, Tor H. G. Palmgren, Mitchell P. Eichelberger
  • Patent number: 5597869
    Abstract: Ionomer compositions which have improved optical properties are disclosed. These compositions comprise ionomers which can be represented as the polymerization product of alpha-olefins having from two to eight carbon atoms, esters of alpha, beta-ethylenically-unsaturated carboxylic acids, metal salts of acrylic and methacrylic acid, and optional alpha, beta-ethylenically-unsaturated comonomers which impart some desired polymer property or properties, such as acidity and/or solvent resistivity. Also disclosed are methods of making these ionomer compositions in a reactive extruder and treating the compositions with acid to impart acidity to the compositions or to only the surface of the compositions.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: January 28, 1997
    Assignee: Chevron Chemical Company
    Inventors: James H. Wang, David Rosendale, Victor P. Kurkov, Leslie P. Theard, Ta Y. Ching, Lewis R. Compton, Tor H. G. Palmgren, Mitchell P. Eichelberger
  • Patent number: 5576396
    Abstract: Ionomer compositions which have improved optical properties are disclosed. These compositions comprise ionomers which can be represented as the polymerization product of alpha-olefins having from two to eight carbon atoms, esters of alpha, beta-ethylenically-unsaturated carboxylic acids, metal salts of acrylic and methacrylic acid, and optional alpha, beta-ethylenically-unsaturated comonomers which impart some desired polymer property or properties, such as acidity and/or solvent resistivity. Also disclosed are methods of making these ionomer compositions in a reactive extruder and treating the compositions with acid to impart acidity to the compositions or to only the surface of the compositions.
    Type: Grant
    Filed: October 27, 1994
    Date of Patent: November 19, 1996
    Assignee: Chevron Chemical Company
    Inventors: James H. Wang, David Rosendale, Victor P. Kurkov, Leslie P. Theard, Ta Y. Ching, Lewis R. Compton, Tor H. G. Palmgren, Mitchell P. Eichelberger
  • Patent number: 5569712
    Abstract: Ionomer compositions which have improved optical properties are disclosed. These compositions comprise ionomers which can be represented as the polymerization product of alpha-olefins having from two to eight carbon atoms, esters of alpha, beta-ethylenically-unsaturated carboxylic acids, metal salts of acrylic and methacrylic acid, and optional alpha, beta-ethylenically-unsaturated comonomers which impart some desired polymer property or properties, such as acidity and/or solvent resistivity. Also disclosed are methods of making these ionomer compositions in a reactive extruder and treating the compositions with acid to impart acidity to the compositions or to only the surface of the compositions.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: October 29, 1996
    Assignee: Chevron Chemical Company
    Inventors: James E. Wang, David Rosendale, Victor P. Kurkov, Leslie P. Theard, Ta Y. Ching, Lewis R. Compton, Tor H. G. Palmgren, Mitchell P. Eichelberger
  • Patent number: 5569722
    Abstract: Ionomer compositions which have improved optical properties are disclosed. These compositions comprise ionomers which can be represented as the polymerization product of alpha-olefins having from two to eight carbon atoms, esters of alpha, beta-ethylenically-unsaturated carboxylic acids, metal salts of acrylic and methacrylic acid, and optional alpha, beta-ethylenically-unsaturated comonomers which impart some desired polymer property or properties, such as acidity and/or solvent resistivity. Also disclosed are methods of making these ionomer compositions in a reactive extruder and treating the compositions with acid to impart acidity to the compositions or to only the surface of the compositions.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: October 29, 1996
    Assignee: Chevron Chemical Company
    Inventors: James H. Wang, David Rosendale, Victor P. Kurkov, Leslie P. Theard, Ta Y. Ching, Lewis R. Compton, Tor H. G. Palmgren, Mitchell P. Eichelberger
  • Patent number: 5189190
    Abstract: Vicinal substituted C.sub.4 -C.sub.24 carboxylic acid derivatives and their silane and siloxane derivatives as well as polymers and copolymers of silane and siloxane derivatives are disclosed. The compounds are useful as coupling agents, emulsifiers and demulsifiers, textile processing aids, and cosmetic additives.
    Type: Grant
    Filed: August 20, 1990
    Date of Patent: February 23, 1993
    Assignee: Henkel Research Corporation
    Inventors: Ta Y. Ching, Lon-Tang W. Lin
  • Patent number: 5179172
    Abstract: Curing agents for epoxy resins composed of (a) the reaction product of a co-reactant comprising either an epichlorohydrin (co) polymer or a (co)polymer of a chlorovinyl acetate, chloroalkyl acrylate with an organic amino compound containing at least one active hydrogen and having a pK.sub.B value within the range of from about 7 to about 9, preferably imidazole and substituted imidazoles; (b) an N-fatty imidazole and (a); (c) an N-fatty imidazole and an elastomeric polymer are disclosed. The curing agents are essentially water insoluble and give rise to epoxy resins which may be cured at relatively low temperatures below about 100.degree. C. The epoxy resins are suitable for use as adhesives, coatings and in composite applications.
    Type: Grant
    Filed: November 21, 1990
    Date of Patent: January 12, 1993
    Assignee: Henkel Research Corporation
    Inventors: Richard M. Chan, Ta Y. Ching, Ta-Wang Lai
  • Patent number: 5072013
    Abstract: Silylated octenyl ethers are used to treat concrete to seal it against penetration by aqueous electrolyte solutions.
    Type: Grant
    Filed: April 16, 1991
    Date of Patent: December 10, 1991
    Assignee: Henkel Research Corporation
    Inventors: Ta Y. Ching, Lon T. W. Lin, Bert Gruber, Edgar Koeppelman
  • Patent number: 4996342
    Abstract: Vicinal substituted C.sub.4 -C.sub.24 carboxylic acid derivatives and their silane and siloxane derivatives as well as polymers and copolymers of silane and siloxane derivatives are disclosed. The compounds are useful as coupling agents, emulsifiers and demulsifiers, textile processing aids, and cosmetic additives.
    Type: Grant
    Filed: February 8, 1989
    Date of Patent: February 26, 1991
    Assignee: Henkel Research Corporation
    Inventors: Ta Y. Ching, Lon-Tang W. Lin
  • Patent number: 4900458
    Abstract: A corrosion inhibiting polyalkylenepolyamine composition comprising a mixture of(a) at least one C-alkyl-ethylene diamine, and(b) at least one di-(C-alkyl)-diethylenetriamine or at least one di-(C-alkyl)-piperazine or a mixture thereof;wherein each C-alkyl group on the ethylene diamine, diethylenetriamine and piperazine independently contains from 10 to 28 carbon atoms. Methods for preparing this composition are also disclosed, as well as methods for its use in inhibiting corrosion of corrodible metals.
    Type: Grant
    Filed: January 11, 1988
    Date of Patent: February 13, 1990
    Assignee: Chevron Research Company
    Inventors: Albert H. Schroeder, Ta Y. Ching, Shigeto Suzuki, Kiyoshi Katsumoto
  • Patent number: 4322455
    Abstract: A process for producing an ultraviolet radiation stabilized polymeric, particularly polycarbonate, article comprising impregnation of the surface of said article with an ultraviolet radiation absorber by heating said polymeric article and applying onto the surface of said heated article an ultraviolet radiation stabilizing composition containing an ultraviolet radiation absorbing compound and a nonaggressive carrier.
    Type: Grant
    Filed: September 15, 1980
    Date of Patent: March 30, 1982
    Assignee: General Electric Company
    Inventors: Daniel R. Olson, Ta Y. Ching