Abstract: An image sensor for sequentially reading signals from photoelectric converting elements disposed in a matrix and formed on a substrate in which both an image sensor and a photometry sensor are incorporated on the same substrate. The sensor includes a light-shielding layer disposed over the area of the substrate except the area of the photoelectric elements, the light-shielding layer forming a lower electrode. A pn-junction photodiode layer is disposed over the light-shielding layer, and an upper transparent electrode layer is disposed at least over the photodiode layer. The upper transparent electrode layer is divided into a plurality of pattern areas. If desired, at least one of the pattern areas of the upper transparent electrode layer may be further divided into a plurality of very small areas and color filters formed over the very small areas.