Patents by Inventor Tac Park

Tac Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050268939
    Abstract: Apparatus for wet cleaning is disclosed. In one example, such an apparatus includes first and second Sulfuric Acid Peroxide Mixture (SPM) baths for removing photoresist on semiconductor wafers that are sequentially provided; a Hot Quick Dump Rinse (HQDR) bath for cleaning the wafers conveyed from the first and second baths; first and second Ammonium Peroxide Replacement (APR) baths for cleaning particles and organic residues remaining on the wafers conveyed from the HQDR bath; and a drier for drying the wafers conveyed from the first and second APR bath.
    Type: Application
    Filed: December 30, 2004
    Publication date: December 8, 2005
    Inventor: Tac Park