Patents by Inventor Tac van Huynh

Tac van Huynh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9793104
    Abstract: Provided is a method of epitaxial deposition, which involves dry-etching a semiconductor substrate with a fluorine containing species and exposing the dry-etched substrate to hydrogen atoms, prior to epitaxially depositing a semiconductor layer to the surface of the substrate.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: October 17, 2017
    Assignee: AIXTRON SE
    Inventors: Maxim Kelman, Shahab Khandan, Scott Dunham, Tac van Huynh, Kenneth B. K. Teo
  • Publication number: 20160225608
    Abstract: Provided is a method of epitaxial deposition, which involves dry-etching a semiconductor substrate with a fluorine containing species and exposing the dry-etched substrate to hydrogen atoms, prior to epitaxially depositing a semiconductor layer to the surface of the substrate.
    Type: Application
    Filed: January 28, 2016
    Publication date: August 4, 2016
    Applicant: AIXTRON
    Inventors: Maxim Kelman, Shahab Khandan, Scott Dunham, Tac van Huynh, Kenneth B.K. Teo