Abstract: An integrated circuit includes first and second gate stacks located over a dielectric layer that is in turn disposed over a semiconductor substrate. Each gate stack includes a floating gate located on the dielectric layer and a control gate located over the floating gate. A first select gate electrode is located on a side of the first gate stack and a second select gate electrode is located on a side of the second gate stack. The first and second select gate electrodes have adjacent sidewalls, each adjacent sidewall having a rounded top corner. The gate stacks may be portions of a split gate memory cell.

Abstract: A split-gate flash memory cell (cell) that can be formed by a method including self-aligned patterning for the select gates includes a semiconductor surface. A first control gate (CG) on a first floating gate (FG) and a second CG on a second FG are on the semiconductor surface. A common source/drain is between the first and second FG. A first select gate and a second select gate are on a select gate dielectric layer that is between a first BL source/drain in the semiconductor surface and the first FG and between a second BL source/drain and the second FG, respectively. The first select gate and the second select gate are spacer-shaped.

Abstract: A split-gate flash memory cell (cell) that can be formed by a method including self-aligned patterning for the select gates includes a semiconductor surface. A first control gate (CG) on a first floating gate (FG) and a second CG on a second FG are on the semiconductor surface. A common source/drain is between the first and second FG. A first select gate and a second select gate are on a select gate dielectric layer that is between a first BL source/drain in the semiconductor surface and the first FG and between a second BL source/drain and the second FG, respectively. The first select gate and the second select gate are spacer-shaped.

Abstract: A method of forming an IC includes providing a field dielectric in a portion of a semiconductor surface, a bipolar or Schottky diode (BSD) class device area, a CMOS transistor area, and a resistor area. A polysilicon layer is deposited to provide a polysilicon gate area for MOS transistors in the CMOS transistor area, over the BSD class device area, and over the field dielectric for providing a polysilicon resistor in the resistor area. A first mask pattern is formed on the polysilicon layer. Using the first mask pattern, first implanting (I1) of the polysilicon resistor providing a first projected range (RP1)<a thickness of the polysilicon layer and second implanting (I2) providing a second RP(RP2), where RP2>RP1. I2 provides a CMOS implant into the semiconductor surface layer in the CMOS transistor area and/or a BSD implant into the semiconductor surface layer in the BSD area.

Abstract: A split-gate flash memory cell (cell) that can be formed by a method including self-aligned patterning for the select gates includes a semiconductor surface. A first control gate (CG) on a first floating gate (FG) and a second CG on a second FG are on the semiconductor surface. A common source/drain is between the first and second FG. A first select gate and a second select gate are on a select gate dielectric layer that is between a first BL source/drain in the semiconductor surface and the first FG and between a second BL source/drain and the second FG, respectively. The first select gate and the second select gate are spacer-shaped.

Abstract: A method of forming an IC includes providing a field dielectric in a portion of a semiconductor surface, a bipolar or Schottky diode (BSD) class device area, a CMOS transistor area, and a resistor area. A polysilicon layer is deposited to provide a polysilicon gate area for MOS transistors in the CMOS transistor area, over the BSD class device area, and over the field dielectric for providing a polysilicon resistor in the resistor area. A first mask pattern is formed on the polysilicon layer. Using the first mask pattern, first implanting (I1) of the polysilicon resistor providing a first projected range (RP1)<a thickness of the polysilicon layer and second implanting (I2) providing a second RP(RP2), where RP2>RP1. I2 provides a CMOS implant into the semiconductor surface layer in the CMOS transistor area and/or a BSD implant into the semiconductor surface layer in the BSD area.

Abstract: A method of forming an IC includes providing a field dielectric in a portion of a semiconductor surface, a bipolar or Schottky diode (BSD) class device area, a CMOS transistor area, and a resistor area. A polysilicon layer is deposited to provide a polysilicon gate area for MOS transistors in the CMOS transistor area, over the BSD class device area, and over the field dielectric for providing a polysilicon resistor in the resistor area. A first mask pattern is formed on the polysilicon layer. Using the first mask pattern, first implanting (I1) of the polysilicon resistor providing a first projected range (RP1)<a thickness of the polysilicon layer and second implanting (I2) providing a second RP (RP2), where RP2>RP1. I2 provides a CMOS implant into the semiconductor surface layer in the CMOS transistor area and/or a BSD implant into the semiconductor surface layer in the BSD area.

Abstract: A method of forming an IC includes providing a field dielectric in a portion of a semiconductor surface, a bipolar or Schottky diode (BSD) class device area, a CMOS transistor area, and a resistor area. A polysilicon layer is deposited to provide a polysilicon gate area for MOS transistors in the CMOS transistor area, over the BSD class device area, and over the field dielectric for providing a polysilicon resistor in the resistor area. A first mask pattern is formed on the polysilicon layer. Using the first mask pattern, first implanting (I1) of the polysilicon resistor providing a first projected range (RP1)<a thickness of the polysilicon layer and second implanting (I2) providing a second RP (RP2), where RP2>RP1. I2 provides a CMOS implant into the semiconductor surface layer in the CMOS transistor area and/or a BSD implant into the semiconductor surface layer in the BSD area.

Abstract: A split-gate flash memory cell (cell) includes a semiconductor surface. A first control gate (CG) on a first floating gate (FG) and a second CG on a second floating gate (FG) are on the semiconductor surface. A common source or common drain is between the first and second FG. A first select gate and a second select gate on a select gate dielectric layer is between a first BL source or drain (S/D) and the first FG and between a second BL S/D and the second FG, respectively. The first select gate has a first pocket region that has a first doping distribution different from a second doping distribution in a second pocket region associated with the second select gate which reduces a variation in read current (Ir) for the cell between measuring Ir using the first select gate and measuring Ir using the second select gate.

Abstract: A split-gate flash memory cell (cell) includes a semiconductor surface. A first control gate (CG) on a first floating gate (FG) and a second CG on a second floating gate (FG) are on the semiconductor surface. A common source or common drain is between the first and second FG. A first select gate and a second select gate on a select gate dielectric layer is between a first BL source or drain (S/D) and the first FG and between a second BL S/D and the second FG, respectively. The first select gate has a first pocket region that has a first doping distribution different from a second doping distribution in a second pocket region associated with the second select gate which reduces a variation in read current (Ir) for the cell between measuring Ir using the first select gate and measuring Ir using the second select gate.

Abstract: A split-gate flash memory cell (cell) includes a semiconductor surface. A first control gate (CG) on a first floating gate (FG) and a second CG on a second floating gate (FG) are on the semiconductor surface. A common source or common drain is between the first and second FG. A first select gate and a second select gate on a select gate dielectric layer is between a first BL source or drain (S/D) and the first FG and between a second BL S/D and the second FG, respectively. The first select gate has a first pocket region that has a first doping distribution different from a second doping distribution in a second pocket region associated with the second select gate which reduces a variation in read current (Ir) for the cell between measuring Ir using the first select gate and measuring Ir using the second select gate.

Abstract: An integrated circuit containing a PMOS transistor with p-channel source/drain (PSD) regions which include a three layer PSD stack containing Si—Ge, carbon and boron. The first PSD layer is Si—Ge and includes carbon at a density between 5×1019 and 2×1020 atoms/cm3. The second PSD layer is Si—Ge and includes carbon at a density between 5×1019 atoms/cm3 and 2×1020 atoms/cm3 and boron at a density above 5×1019 atoms/cm3. The third PSD layer is silicon or Si—Ge, includes boron at a density above 5×1019 atoms/cm3 and is substantially free of carbon. After formation of the three layer epitaxial stack, the first PSD layer has a boron density less than 10 percent of the boron density in the second PSD layer. A process for forming an integrated circuit containing a PMOS transistor with a three layer PSD stack in PSD recesses.

Abstract: An integrated circuit containing a PMOS transistor with p-channel source/drain (PSD) regions which include a three layer PSD stack containing Si—Ge, carbon and boron. The first PSD layer is Si—Ge and includes carbon at a density between 5×1019 and 2×1020 atoms/cm3. The second PSD layer is Si—Ge and includes carbon at a density between 5'31019 atoms/cm3 and 2×1020 atoms/cm3 and boron at a density above 5×1019 atoms/cm3. The third PSD layer is silicon or Si—Ge, includes boron at a density above 5×1019 atoms/cm3 and is substantially free of carbon. After formation of the three layer epitaxial stack, the first PSD layer has a boron density less than 10 percent of the boron density in the second PSD layer. A process for forming an integrated circuit containing a PMOS transistor with a three layer PSD stack in PSD recesses.

Abstract: Methods are disclosed for semiconductor device fabrication in which dopants are selectively implanted into transistor gate structures to counteract or compensate for dopant depletion during subsequent fabrication processing. A patterned implant mask is formed over a semiconductor device, which exposes at least a portion of the gate structure and covers the remaining upper surfaces of the device. Thereafter, dopants are selectively implanted in to the exposed gate structure.

Abstract: A semiconductor device includes source/drain regions formed in a substrate and having a concentration of nitrogen of at least about 5E18 cm?3. A gate dielectric is located over the substrate and between the source/drain regions. Gate sidewall spacers are located over said source/drain regions. A nitrogen-doped electrode including polysilicon is located over the gate dielectric. The electrode has a concentration of nitrogen therein greater than the concentration of nitrogen in the source/drain regions.

Abstract: Methods are disclosed for semiconductor device fabrication in which dopants are selectively implanted into transistor gate structures to counteract or compensate for dopant depletion during subsequent fabrication processing. A patterned implant mask is formed over a semiconductor device, which exposes at least a portion of the gate structure and covers the remaining upper surfaces of the device. Thereafter, dopants are selectively implanted into the exposed gate structure.

Abstract: Methods are disclosed for semiconductor device fabrication in which dopants are selectively implanted into transistor gate structures to counteract or compensate for dopant depletion during subsequent fabrication processing. A patterned implant mask is formed over a semiconductor device, which exposes at least a portion of the gate structure and covers the remaining upper surfaces of the device. Thereafter, dopants are selectively implanted in to the exposed gate structure.

Abstract: Methods are disclosed for semiconductor device fabrication in which dopants are selectively implanted into transistor gate structures to counteract or compensate for dopant depletion during subsequent fabrication processing. A patterned implant mask is formed over a semiconductor device, which exposes at least a portion of the gate structure and covers the remaining upper surfaces of the device. Thereafter, dopants are selectively implanted into the exposed gate structure.

Abstract: Methods are disclosed for semiconductor device fabrication in which MOS transistor gates are to be formed. Polysilicon gate structures and sidewall spacers are formed, with upper portions of the gate sidewalls exposed. Angled implantation processing is employed to impart dopants to the top and exposed sidewall portions of the gate structure to mitigate poly depletion.

Abstract: Methods are disclosed for semiconductor device fabrication in which dopants are selectively implanted into transistor gate structures to counteract or compensate for dopant depletion during subsequent fabrication processing. A patterned implant mask is formed over a semiconductor device, which exposes at least a portion of the gate structure and covers the remaining upper surfaces of the device. Thereafter, dopants are selectively implanted into the exposed gate structure.