Abstract: An exposure apparatus is provided with a light source for emitting pulse light and exposes a substrate via to the pulse light an original. Further, the exposure apparatus comprises a detection unit for detecting the light quantity of the pulse light and a controller for controlling the light source and the detection unit. Here, the controller is configured to execute a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source, based on light quantities of a plurality of pulse lights detected by the detector by causing the light source to emit the plurality of the pulse lights with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights.

Abstract: An exposure apparatus is provided with a light source for emitting pulse light and exposes a substrate via to the pulse light an original. Further, the exposure apparatus comprises a detection unit for detecting the light quantity of the pulse light and a controller for controlling the light source and the detection unit. Here, the controller is configured to execute a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source, based on light quantities of a plurality of pulse lights detected by the detector by causing the light source to emit the plurality of the pulse lights with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights.

Abstract: A scanning exposure apparatus is configured to project a pattern of an original onto a substrate by a projection optical system while scanning the original and the substrate, thereby scanning-exposing the substrate, the apparatus including a barycentric position adjusting unit configured to adjust, based on a target barycentric position, a barycentric position, in a direction of a scanning axis, of exposure light that irradiates an image plane of the projection optical system.

Abstract: A scanning exposure apparatus includes a light source, a stage configured to move while having a substrate mounted thereon, a control unit configured to control the light source and the stage such that the substrate is exposed to radiant energy while the speed of the stage is changed, a filter having a transmittance distribution according to a change in speed of the stage and being disposed so as to be insertable into a light path for exposure, and a driving unit configured to scan the filter in synchronization with the scanning of the stage.

Abstract: A scanning exposure apparatus is configured to project a pattern of an original onto a substrate by a projection optical system while scanning the original and the substrate, thereby scanning-exposing the substrate, the apparatus including a barycentric position adjusting unit configured to adjust, based on a target barycentric position, a barycentric position, in a direction of a scanning axis, of exposure light that irradiates an image plane of the projection optical system.

Abstract: An exposure apparatus for performing exposure of an object to light. A measuring device measures a wavelength spectrum of the light. A processor calculates a center wavelength of light based on the measured wavelength spectrum, and a main controller determines whether the exposure is to be performed, based on the calculated center wavelength of the light. The wavelength spectrum includes a first spectral component and a second spectral component, and the processor calculates the center wavelength of the light ?0 in accordance with: ?0=?0-1+??×(??—A/(??—A+??—B)), and ??_A:??_B=Energy-2:Energy-1, where ?0-1 is a center wavelength of the first spectral component, ?0-2 (?0-2>?0-1) is a center wavelength of the second spectral component, Energy-1 is a peak light intensity of the first spectral component, Energy-2 is a peak light intensity of the second spectral component, and ??=?0-2??0-1.

Abstract: An exposure apparatus configured to expose a substrate via a reticle includes a light source emitting light, a measuring device performing measurement of a wavelength spectrum of the light emitted from the light source, and a controller. The controller calculates a central wavelength of the light emitted from the light source based on the wavelength spectrum measured by the measuring device, calculates a difference between the calculated central wavelength and a central wavelength set to the light source for the measurement, and updates the central wavelength to be set to the light source based on the calculated difference.

Abstract: An apparatus that includes an output unit having a photoelectric converting element and configured to produce a signal corresponding to light incident on the photoelectric converting element, a restricting unit configured to restrict a light receiving region of the photoelectric converting element to one of a first region and a second region, and a calculating unit configured to calculate a sensitivity of the first region, based on an output signal obtained from the output unit with respect to the first region to which the light receiving unit is restricted by the restricting unit, and on an output signal obtained from the output unit with respect to the second region to which the light receiving region is restricted by the restricting unit.

Abstract: An exposure apparatus configured to expose a substrate via a reticle includes a light source emitting light, a measuring device performing measurement of a wavelength spectrum of the light emitted from the light source, and a controller. The controller calculates a central wavelength of the light emitted from the light source based on the wavelength spectrum measured by the measuring device, calculates a difference between the calculated central wavelength and a central wavelength set to the light source for the measurement, and updates the central wavelength to be set to the light source based on the calculated difference.

Abstract: An exposure apparatus for performing an exposure of expose an object to light is disclosed. The apparatus comprises a measuring device configured to measure a wavelength spectrum of the light, a processor configured to calculate a central wavelength of the light based on the measured spectrum, and a main controller. The processor obtains a central wavelength of each of a plurality of components of the measured spectrum and a light intensity corresponding to each of the plurality of components, and calculates the central wavelength of the light based on the obtained central wavelengths and the obtained light intensities. The main controller determines whether the exposure is to be performed, based on the calculated central wavelength of the light.

Abstract: Disclosed is an apparatus that includes an output unit having a photoelectric converting element, for producing a signal corresponding to light incident on the photoelectric converting element, a restricting unit for restricting a light receiving region of the photoelectric converting element to one of a first region and a second region, and a calculating unit for calculating a sensitivity of the first region, on the basis of an output signal related to the first region and obtainable through cooperation of the output unit and the restricting unit, and of an output signal related to the second region and obtainable through cooperation of the output unit and the restricting unit.

Abstract: An exposure apparatus which has a light source and transfers a pattern of an original to a substrate using light supplied from the light source includes a photoelectric sensor used to control an amount of light to which the substrate is exposed, a memory storing a first value for correcting an output value of the photoelectric sensor with respect to each accumulated energy of light, having a first power, with which the photoelectric sensor is irradiated, a calculator which calculates a second value for correcting an output value of the photoelectric sensor corresponding to a second accumulated energy of light, having a second power, with which the photoelectric sensor is irradiated, based on the first value in the memory corresponding to the second accumulated energy, and a ratio of the second power to the first power, and a correction unit which corrects an output value of said photoelectric sensor using the second value.

Abstract: It is an object of this invention to accurately correct an output variation due to a change in temperature of a photoelectric sensor. An exposure apparatus includes a photoelectric sensor (13, 15) for controlling exposure of a wafer, a memory (21) that stores the output variation characteristic of the photoelectric sensor (13, 15) with respect to the quantity of light with which the photoelectric sensor is irradiated, a calculator (22) that calculates the output variation amount of the photoelectric sensor (13, 15) on the basis of the quantity of the light with which the photoelectric sensor (13, 15) is irradiated, the energy per unit time of the light, and the output variation characteristic stored in the memory (21), and a compensator (23) that corrects an output from the photoelectric sensor (13, 15) on the basis of the output variation amount calculated by the calculator (22).