Patents by Inventor Tadahiro KAWASAKI
Tadahiro KAWASAKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11817289Abstract: As a device for correcting positive spherical aberration of an electromagnetic lens for a charged particle beam, a spherical aberration correction device combining a hole electrode and a ring electrode is known. In this spherical aberration correction device, when a voltage is applied between the hole electrode and the ring electrode, the focus of the charged particle beam device changes due to the convex lens effect generated in the hole electrode. Therefore, in a charged particle beam device including a charged particle beam source which generates a charged particle beam, a charged particle beam aperture having a ring shape, and a charged particle beam aperture power supply which applies a voltage to the charged particle beam aperture, the charged particle beam aperture power supply is configured to apply, to the charged particle beam aperture, a voltage having a polarity opposite to a polarity of charges of the charged particle beam.Type: GrantFiled: April 20, 2022Date of Patent: November 14, 2023Assignees: Hitachi High-Tech Corporation, Japan Fine Ceramics CenterInventors: Tsunenori Nomaguchi, Shunichi Motomura, Tadahiro Kawasaki, Takeharu Kato, Ryuji Yoshida
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Publication number: 20220246385Abstract: As a device for correcting positive spherical aberration of an electromagnetic lens for a charged particle beam, a spherical aberration correction device combining a hole electrode and a ring electrode is known. In this spherical aberration correction device, when a voltage is applied between the hole electrode and the ring electrode, the focus of the charged particle beam device changes due to the convex lens effect generated in the hole electrode. Therefore, in a charged particle beam device including a charged particle beam source which generates a charged particle beam, a charged particle beam aperture having a ring shape, and a charged particle beam aperture power supply which applies a voltage to the charged particle beam aperture, the charged particle beam aperture power supply is configured to apply, to the charged particle beam aperture, a voltage having a polarity opposite to a polarity of charges of the charged particle beam.Type: ApplicationFiled: April 20, 2022Publication date: August 4, 2022Inventors: Tsunenori NOMAGUCHI, Shunichi MOTOMURA, Tadahiro KAWASAKI, Takeharu KATO, Ryuji YOSHIDA
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Patent number: 11335532Abstract: As a device for correcting positive spherical aberration of an electromagnetic lens for a charged particle beam, a spherical aberration correction device combining a hole electrode and a ring electrode is known. In this spherical aberration correction device, when a voltage is applied between the hole electrode and the ring electrode, the focus of the charged particle beam device changes due to the convex lens effect generated in the hole electrode. Therefore, in a charged particle beam device including a charged particle beam source which generates a charged particle beam, a charged particle beam aperture having a ring shape, and a charged particle beam aperture power supply which applies a voltage to the charged particle beam aperture, the charged particle beam aperture power supply is configured to apply, to the charged particle beam aperture, a voltage having a polarity opposite to a polarity of charges of the charged particle beam.Type: GrantFiled: March 29, 2018Date of Patent: May 17, 2022Assignees: Hitachi High-Tech Corporation, Japan Fine Ceramics CenterInventors: Tsunenori Nomaguchi, Shunichi Motomura, Tadahiro Kawasaki, Takeharu Kato, Ryuji Yoshida
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Patent number: 11164716Abstract: When using a charged particle beam aperture having a ring shape in a charged particle beam device, the charged particle beam with the highest current density immediately above the optical axis, among the charged particle beams is blocked, so that it is difficult to dispose the charged particle beam aperture at the optimal mounting position. Therefore, in addition to the ring-shaped charged particle beam aperture, a hole-shaped charged particle beam aperture is provided, and it is possible to switch between the case where the ring-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam and the case where the hole-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam.Type: GrantFiled: March 29, 2018Date of Patent: November 2, 2021Assignees: Hitachi High-Tech Corporation, Japan Fine Ceramics CenterInventors: Shunichi Motomura, Tsunenori Nomaguchi, Tadahiro Kawasaki, Takeharu Kato, Ryuji Yoshida
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Publication number: 20210118641Abstract: As a device for correcting positive spherical aberration of an electromagnetic lens for a charged particle beam, a spherical aberration correction device combining a hole electrode and a ring electrode is known. In this spherical aberration correction device, when a voltage is applied between the hole electrode and the ring electrode, the focus of the charged particle beam device changes due to the convex lens effect generated in the hole electrode. Therefore, in a charged particle beam device including a charged particle beam source which generates a charged particle beam, a charged particle beam aperture having a ring shape, and a charged particle beam aperture power supply which applies a voltage to the charged particle beam aperture, the charged particle beam aperture power supply is configured to apply, to the charged particle beam aperture, a voltage having a polarity opposite to a polarity of charges of the charged particle beam.Type: ApplicationFiled: March 29, 2018Publication date: April 22, 2021Inventors: Tsunenori NOMAGUCHI, Shunichi MOTOMURA, Tadahiro KAWASAKI, Takeharu KATO, Ryuji YOSHIDA
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Publication number: 20210027977Abstract: When using a charged particle beam aperture having a ring shape in a charged particle beam device, the charged particle beam with the highest current density immediately above the optical axis, among the charged particle beams is blocked, so that it is difficult to dispose the charged particle beam aperture at the optimal mounting position. Therefore, in addition to the ring-shaped charged particle beam aperture, a hole-shaped charged particle beam aperture is provided, and it is possible to switch between the case where the ring-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam and the case where the hole-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam.Type: ApplicationFiled: March 29, 2018Publication date: January 28, 2021Inventors: Shunichi MOTOMURA, Tsunenori NOMAGUCHI, Tadahiro KAWASAKI, Takeharu KATO, Ryuji YOSHIDA
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Patent number: 10096448Abstract: An electromagnetic lens for charged particle beam exhibits positive spherical aberration. A complicated combination of electromagnetic lenses had been necessary for correcting this spherical aberration. One of a circular aperture or a ring-shaped aperture is provided on an incident plate arranged on an incident side of charged particle beam, another of the circular aperture or the ring-shaped aperture is provided on a plate arranged on an emission side thereof, and a voltage is applied between the incident plate and the emission plate. By so doing, an electric field generated in the ring-shaped aperture emanates, which resolves the positive spherical aberration. The spherical aberration can be corrected by an extremely simple and easily implemented structure.Type: GrantFiled: February 8, 2016Date of Patent: October 9, 2018Assignee: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITYInventors: Tadahiro Kawasaki, Takayoshi Tanji, Takashi Ikuta
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Publication number: 20180114670Abstract: An electromagnetic lens for charged particle beam exhibits positive spherical aberration. A complicated combination of electromagnetic lenses had been necessary for correcting this spherical aberration. One of a circular aperture or a ring-shaped aperture is provided on an incident plate arranged on an incident side of charged particle beam, another of the circular aperture or the ring-shaped aperture is provided on a plate arranged on an emission side thereof, and a voltage is applied between the incident plate and the emission plate. By so doing, an electric field generated in the ring-shaped aperture emanates, which resolves the positive spherical aberration. The spherical aberration can be corrected by an extremely simple and easily implemented structure.Type: ApplicationFiled: February 8, 2016Publication date: April 26, 2018Applicant: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITYInventors: Tadahiro KAWASAKI, Takayoshi TANJI, Takashi IKUTA