Patents by Inventor Tadahito Nakashima

Tadahito Nakashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11986795
    Abstract: A process for treating a petroleum fraction and for efficiently absorbing an organic halogen compound from a fluid mixture of the organic halogen compound and an inorganic halogen compound derived from crude oil. Also disclosed is an improvement in absorption performance of a halogen-compound-absorbing material, thereby reducing the frequency with which the absorbing material is exchanged. The absorbing agent includes attapulgite (palygorskite) having high absorption performance with respect to organic halogen compounds. Also disclosed is an absorption column in which the aforementioned absorbing agent and a halogen-compound-absorbing agent, that includes zinc oxide, are disposed in series, thereby making it possible to raise the treatment performance with respect to a fluid that contains, in high concentrations, the organic halogen compound in addition to the inorganic halogen compound.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: May 21, 2024
    Assignees: CLARIANT CATALYSTS (JAPAN) K.K., ENEOS CORPORATION
    Inventors: Tadahito Nakashima, Hyun-Joong Kim, Kaoru Fujiwara
  • Publication number: 20220055011
    Abstract: A process for treating a petroleum fraction and for efficiently absorbing an organic halogen compound from a fluid mixture of the organic halogen compound and an inorganic halogen compound derived from crude oil. Also disclosed is an improvement in absorption performance of a halogen-compound-absorbing material, thereby reducing the frequency with which the absorbing material is exchanged. The absorbing agent includes attapulgite (palygorskite) having high absorption performance with respect to organic halogen compounds. Also disclosed is an absorption column in which the aforementioned absorbing agent and a halogen-compound-absorbing agent, that includes zinc oxide, are disposed in series, thereby making it possible to raise the treatment performance with respect to a fluid that contains, in high concentrations, the organic halogen compound in addition to the inorganic halogen compound.
    Type: Application
    Filed: July 11, 2019
    Publication date: February 24, 2022
    Inventors: Tadahito Nakashima, Hyun-Joong Kim, Kaoru Fujiwara
  • Patent number: 11033878
    Abstract: An agent for removing a halogen gas, such as chlorine, in a waste gas by means of reduction; a method for producing this agent; a method for removing a halogen gas by use of this agent; and a system for removing a halogen gas. The agent for removing the halogen gas contains at least pseudo-boehmite, that serves as a host material, and a sulfur-containing reducing agent, that serves as a guest material. 1-8% by weight of the reducing agent, in terms of elemental sulfur, based on the total amount of the pseudo-boehmite and sulfur-containing reducing agent is present in the agent. At least one inorganic compound selected from among oxides, carbonates salts and hydrocarbon salts of alkaline earth metal elements, transition metal elements and zinc group elements is additionally contained in the agent as a third component.
    Type: Grant
    Filed: November 15, 2017
    Date of Patent: June 15, 2021
    Assignee: CLARIANT CATALYSTS (JAPAN) K.K.
    Inventors: Tadahito Nakashima, Kenichiro Sunata, Yasushi Shioya, Hyun-Joong Kim
  • Publication number: 20200101418
    Abstract: The present invention relates to a fluorine-containing gas removing agent comprising an alumina and an alkali earth metal compound, wherein an ammonia desorption curve obtained by an ammonia TPD-MS method having a mass-to-charge ratio of 15 has a peak in a range lower than 200° C. and has a shoulder in a range of 200° C. or higher.
    Type: Application
    Filed: April 10, 2018
    Publication date: April 2, 2020
    Inventors: Tadahito NAKASHIMA, Hyun-Joong KIM
  • Publication number: 20200030744
    Abstract: A halogen gas removing agent for removing halogen gas from a gas flow, which reduces the risk of leakage of the halogen gas exhausted from a semiconductor production process by treating the gas flow with the removing agent and a process for producing the removing agent. Also provided are an apparatus for removing the halogen gas using the removing agent, and a method for monitoring the state of consumption of the halogen gas. The halogen gas removing agent includes an inorganic compound base material, a sulfur-containing reducing compound and a color indicator, preferably using a pseudoboehmite as the base material, adding a pH indicator having a transition range in a pH range of 3 to 8 as the color indicator, and adding a basic metal compound such as zinc oxide.
    Type: Application
    Filed: July 16, 2019
    Publication date: January 30, 2020
    Inventors: Kenichiro Sunata, Tadahito Nakashima, Hyun-Joong Kim
  • Publication number: 20200023336
    Abstract: An agent for removing a halogen gas, such as chlorine, in a waste gas by means of reduction; a method for producing this agent; a method for removing a halogen gas by use of this agent; and a system for removing a halogen gas. The agent for removing the halogen gas contains at least pseudo-boehmite, that serves as a host material, and a sulfur-containing reducing agent, that serves as a guest material. 1-8% by weight of the reducing agent, in terms of elemental sulfur, based on the total amount of the pseudo-boehmite and sulfur-containing reducing agent is present in the agent. At least one inorganic compound selected from among oxides, carbonates salts and hydrocarbon salts of alkaline earth metal elements, transition metal elements and zinc group elements is additionally contained in the agent as a third component.
    Type: Application
    Filed: November 15, 2017
    Publication date: January 23, 2020
    Inventors: Tadahito Nakashima, Kenichiro Sunata, Yasushi Shioya, Hyun-Joong Kim
  • Patent number: 10449510
    Abstract: An adsorbent is provided to adsorb ruthenium from aqueous solution for recovery and/or reuse or removal of said ruthenium, and a method for purifying, for example, sea water and/or water containing sodium ions, magnesium ions, calcium ions, chlorine ions or other ions, polluted with a radioactive element, using said adsorbent. The ruthenium adsorbent includes manganese in the form of oxides thereof. The adsorbent can further include at least one additional transition metal element other than manganese, such as copper. The adsorbent soaked in water removes radioactive ruthenium or the like through adsorption, and thereby can purify, for example, sea water and/or water containing sodium ions, magnesium ions, calcium ions, chlorine ions or other ions.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: October 22, 2019
    Assignees: Clariant Catalysts (Japan) K.K., Ebara Corporation
    Inventors: Tadahito Nakashima, Hyun-Joong Kim, Takashi Sakuma, Makoto Komatsu, Takeshi Izumi
  • Publication number: 20180071712
    Abstract: An adsorbent is provided to adsorb ruthenium from aqueous solution for recovery and/or reuse or removal of said ruthenium, and a method for purifying, for example, sea water and/or water containing sodium ions, magnesium ions, calcium ions, chlorine ions or other ions, polluted with a radioactive element, using said adsorbent. The ruthenium adsorbent includes manganese in the form of oxides thereof. The adsorbent can further include at least one additional transition metal element other than manganese, such as copper. The adsorbent soaked in water removes radioactive ruthenium or the like through adsorption, and thereby can purify, for example, sea water and/or water containing sodium ions, magnesium ions, calcium ions, chlorine ions or other ions.
    Type: Application
    Filed: March 22, 2016
    Publication date: March 15, 2018
    Inventors: Tadahito Nakashima, Hyun-Joong Kim, Takashi Sakuma, Makoto Komatsu, Takeshi Izumi