Patents by Inventor Tadamitsu Nakamura

Tadamitsu Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11592744
    Abstract: A positive-type photosensitive resin composition comprises a (a) polybenzoxazole precursor, a (b) crosslinking agent, a (c) photosensitive agent, and a (d) solvent, wherein the (a) polybenzoxazole precursor comprises a structure represented by Formula (1) below, and the (c) photosensitive agent is a compound comprising a structure represented by Formula (2) below. In Formula (1), U is a bivalent organic group, a single bond, —O—, or —SO2—, V is a group comprising an aliphatic structure, and the carbon number in the aliphatic structure is 1 to 30.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: February 28, 2023
    Assignee: HD MICROSYSTEMS, LTD.
    Inventors: Daisaku Matsukawa, Tadamitsu Nakamura
  • Patent number: 11592743
    Abstract: A positive-type photosensitive resin composition comprises a (a) polybenzoxazole precursor, a (b) crosslinking agent, a (c) photosensitive agent, and a (d) solvent, wherein the (a) component comprises a structural unit represented by Formula (1) below, and the (b) component is a compound represented by Formula (2) below. In Formula (1), U is a bivalent organic group, a single bond, —O—, or —SO2—, V is a group comprising an aliphatic structure, and the carbon number in the aliphatic structure is 1 to 30. In Formula (2), R1 is independently a hydrogen atom or a group represented by —CH2—O—R2. At least one of the plurality of R1s is a group represented by —CH2—O—R2. R2 is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: February 28, 2023
    Assignee: HD MICROSYSTEMS, LTD.
    Inventor: Tadamitsu Nakamura
  • Patent number: 11021572
    Abstract: Provided is a photosensitive resin composition containing; (A) a polymer having an acidic functional group or a substituent derived therefrom; (B) a photoreactive compound; (C) a solvent; and (D) a nitrogen-containing aromatic compound represented by the following general formula (1).
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: June 1, 2021
    Assignee: HD MICROSYSTEMS, LTD.
    Inventors: Ayaka Azuma, Satoshi Abe, Kazuya Soejima, Masato Nishimura, Tadamitsu Nakamura
  • Publication number: 20190161580
    Abstract: Provided is a photosensitive resin composition containing; (A) a polymer having an acidic functional group or a substituent derived therefrom; (B) a photoreactive compound; (C) a solvent; and (D) a nitrogen-containing aromatic compound represented by the following general formula (1).
    Type: Application
    Filed: July 25, 2017
    Publication date: May 30, 2019
    Inventors: Ayaka AZUMA, Satoshi ABE, Kazuya SOEJIMA, Masato NISHIMURA, Tadamitsu NAKAMURA
  • Publication number: 20190049842
    Abstract: A positive-type photosensitive resin composition comprises a (a) polybenzoxazole precursor, a (b) crosslinking agent, a (c) photosensitive agent, and a (d) solvent, wherein the (a) polybenzoxazole precursor comprises a structure represented by Formula (1) below, and the (c) photosensitive agent is a compound comprising a structure represented by Formula (2) below. In Formula (1), U is a bivalent organic group, a single bond, —O—, or —SO2—, V is a group comprising an aliphatic structure, and the carbon number in the aliphatic structure is 1 to 30.
    Type: Application
    Filed: February 5, 2016
    Publication date: February 14, 2019
    Inventors: Daisaku MATSUKAWA, Tadamitsu NAKAMURA
  • Publication number: 20190041748
    Abstract: A positive-type photosensitive resin composition comprises a (a) polybenzoxazole precursor, a (b) crosslinking agent, a (c) photosensitive agent, and a (d) solvent, wherein the (a) component comprises a structural unit represented by Formula (1) below, and the (b) component is a compound represented by Formula (2) below. In Formula (1), U is a bivalent organic group, a single bond, —O—, or —SO2—, V is a group comprising an aliphatic structure, and the carbon number in the aliphatic structure is 1 to 30. In Formula (2), R1 is independently a hydrogen atom or a group represented by —CH2—O—R2. At least one of the plurality of R1s is a group represented by —CH2—O—R2. R2 is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
    Type: Application
    Filed: February 5, 2016
    Publication date: February 7, 2019
    Inventor: Tadamitsu NAKAMURA
  • Patent number: 6121196
    Abstract: A herbicidal composition for preventing the growth of weeds in rice fields which comprises active carbon in a powder form dispersed in water in the presence of a starch or a derivative of starch. The herbicidal composition prevents the growth of weeds on the surface of soil covered with water in a rice field by decreasing the amount of light which passes through the water covering the soil. The herbicidal composition does not cause any problem regarding food sanitation, maintains the effect for a long period of time with stability by repeated applications, is inexpensive and can be used advantageously.
    Type: Grant
    Filed: December 4, 1998
    Date of Patent: September 19, 2000
    Assignee: Dainichiseika Color & Chemicals Mfg. Co., Ltd.
    Inventors: Hidejiro Shibayama, Tadamitsu Nakamura, Takuji Kihara, Shinichi Ogawa, Fujiko Yamashita
  • Patent number: 5037581
    Abstract: An improved electroconductive coating material containing electroconductive organic fiber of 10.sup.2 .OMEGA..multidot.cm or lower in specific resistance, and preferably the organic fiber is 0.1 to 5 mm in length and 2 to 500 in aspect ratio. The coating material of the invention can form an improved uniform coating film which is excellent in electroconductivity and anti-static property, and it is hardly peeled off with maintaining its advantageous properties for a long period of time.
    Type: Grant
    Filed: October 27, 1989
    Date of Patent: August 6, 1991
    Assignees: Nippon Petrochemicals Co., Ltd., Dainichiseika Color & Chemicals Mfg. Co., Ltd., Nihon Sanmo Dyeing Co., Ltd.
    Inventors: Hachiro Saitoh, Tadamitsu Nakamura, Hiromichi Wada, Yoshikazu Igarashi
  • Patent number: 4482467
    Abstract: A liquid for the absorption of solar heat, useful as an heat-absorbing medium in water heaters and heat collectors, which comprises:(a) a dispersing medium selected from the group consisting of propylene glycol, mixture of propylene glycol with water, mixture of propylene glycol with water and glycerin, and mixture of glycerin with water,(b) a dispersant selected from the group consisting of polyvinylpyrrolidone, caramel, and mixture of polyvinylpyrrolidone with caramel, and(c) a powdered activated carbon as a black coloring material.
    Type: Grant
    Filed: July 14, 1982
    Date of Patent: November 13, 1984
    Assignees: Dainichiseika Colour & Chemicals Mfg. Co., Ltd., Kabushiki Kaisha Komatsu Seisakusho
    Inventors: Tadamitsu Nakamura, Yogaku Iwamoto, Kanichi Kadotani, Tokuo Marui