Patents by Inventor Tadao Nakakuki

Tadao Nakakuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for detecting edge of semitransparent plane substance
    Patent number: 4559452
    Abstract: An apparatus for detecting an edge of a semitransparent plane substance provided with a light source array including a plurality of light sources and a photosensor array including a plurality of photosensors. A selection circuit selects a pair of one of the light sources and one of the photosensors, respectively, and a comparator circuit compares the outputs of each of the photosensors in each pair when no detected substance exists between the light source array and the photosensor array, and the corresponding outputs when a substance exists between the light source array and the photosensor array, so that the edge portion of the substance can be detected.
    Type: Grant
    Filed: May 27, 1983
    Date of Patent: December 17, 1985
    Assignee: Fujitsu Limited
    Inventors: Seigo Igaki, Tadao Nakakuki, Takefumi Inagaki, Shuetsu Oikawa, Takashi Fujimura
  • Pattern inspection system
    Patent number: 4547895
    Abstract: A pattern inspection system for inspecting a pattern formed on a base, such as a photomask, by means of laser beam scanning which includes a device for detecting the body and edges of the pattern, a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern, and a device for eliminating pinholes and stains within the pattern.
    Type: Grant
    Filed: September 30, 1982
    Date of Patent: October 15, 1985
    Assignee: Fujitsu Limited
    Inventors: Kikuo Mita, Masayuki Oyama, Takashi Yoshida, Masato Nakashima, Katsumi Fujihara, Tadao Nakakuki
  • Pattern inspection system
    Patent number: 4392120
    Abstract: A pattern inspection system, for inspecting a pattern formed on a base, such as a photo-mask, by means of laser beam scanning, which includes a device for detecting the body and edges of the pattern a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern and a device for eliminating pinholes and stains within a pattern.
    Type: Grant
    Filed: June 23, 1980
    Date of Patent: July 5, 1983
    Assignee: A. Aoki & Associates
    Inventors: Kikuo Mita, Masayuki Oyama, Takashi Yoshida, Masato Nakashima, Katsumi Fujihara, Tadao Nakakuki