Patents by Inventor Tadao Ohkusa

Tadao Ohkusa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CVD photo resist deposition
    Patent number: 6179922
    Abstract: A system for depositing photo resist using chemical vapor deposition (“CVD”) onto a semiconductor substrate is disclosed. The system includes a processing chamber and a gas chamber. The gas chamber receives a monomer and supplies sufficient energy for polymerization of the monomer, thereby creating a polymer vapor. The processing chamber receives the semiconductor substrate and the polymer vapor. CVD occurs and the polymer vapor deposits a thin layer photo resist on the surface semiconductor substrate.
    Type: Grant
    Filed: July 9, 1999
    Date of Patent: January 30, 2001
    Assignee: Ball Semiconductor, Inc.
    Inventors: Akira Ishikawa, Tadao Ohkusa