Patents by Inventor Tadashi Kanosue

Tadashi Kanosue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Charged particle beam application system
    Patent number: 7385194
    Abstract: An object of the present invention is to measure a landing angle even in a multi electron beam lithography system in which current amount of each beam is small. Another object thereof is to measure an absolute value of the landing angle and a relative landing angle with the high SN ratio. In a transmission detector including two diaphragm plates (first and second diaphragms) and a detector, a detection angle determined by a distance between the first and second diaphragms and an aperture diameter of the second diaphragm is made equal to or smaller than the divergence angle of the electron beam to be measured, and the landing angle is determined based on the relation between a center of the fine hole of the first diaphragm and the center of the aperture of the second diaphragm at which the amount of detected current is maximum.
    Type: Grant
    Filed: June 28, 2006
    Date of Patent: June 10, 2008
    Assignees: Hitachi High-Technologies Corporation, Canon Kabushiki Kaisha
    Inventors: Osamu Kamimura, Tadashi Kanosue, Yasunari Sohda, Susumu Goto
  • Charged particle beam application system
    Publication number: 20070023654
    Abstract: An object of the present invention is to measure a landing angle even in a multi electron beam lithography system in which current amount of each beam is small. Another object thereof is to measure an absolute value of the landing angle and a relative landing angle with the high SN ratio. In a transmission detector including two diaphragm plates (first and second diaphragms) and a detector, a detection angle determined by a distance between the first and second diaphragms and an aperture diameter of the second diaphragm is made equal to or smaller than the divergence angle of the electron beam to be measured, and the landing angle is determined based on the relation between a center of the fine hole of the first diaphragm and the center of the aperture of the second diaphragm at which the amount of detected current is maximum.
    Type: Application
    Filed: June 28, 2006
    Publication date: February 1, 2007
    Inventors: Osamu Kamimura, Tadashi Kanosue, Yasunari Sohda, Susumu Goto