Abstract: Provided is a reflective photomask reflecting an EUV light and used to irradiate a reflected light to a transfer sample, the reflective photomask including: a substrate; a high reflection part formed on the substrate; and a low reflection part formed on the high reflection part and being patterned, wherein the low reflection part, being patterned, includes at least one or more layers being stacked; and at least one layer of the low reflection part, being patterned, includes a layer including an Sn and an oxygen.

Abstract: A reflection type photomask blank includes: a substrate; a multilayer reflection film formed on the substrate for reflecting exposure light; a protection film formed on the multilayer reflection film for protecting the multilayer reflection film; an absorber layer for absorbing the exposure light on the protection film; and a shock absorbing film formed between the absorber layer and the protection film, with a resistance to etching which is performed when an exposure transfer pattern of the absorber layer is formed, in which the protection film is: a compound including Zr and Si; a compound including Zr, Si, and at least either one of O and N; or a single element or a compound including at least any one of Ru, C, and Y.

Abstract: Provided is a reflective photomask reflecting an EUV light and used to irradiate a reflected light to a transfer sample, the reflective photomask including: a substrate; a high reflection part formed on the substrate; and a low reflection part formed on the high reflection part and being patterned, wherein the low reflection part, being patterned, includes at least one or more layers being stacked; and at least one layer of the low reflection part, being patterned, includes a layer including an Sn and an oxygen.

Abstract: In a reflection type photomask blank having a multilayer reflection film and a light absorption laminated layer laminated on a substrate, the light absorption laminated layer is composed by laminating a second light absorption layer having DUV light absorbing capacity and containing at least one of nitrogen and oxygen, and tantalum and silicon, on a first light absorption layer having EUV light absorbing capacity and containing tantalum and silicon.

Abstract: A reflection type photomask blank includes: a substrate; a multilayer reflection film formed on the substrate for reflecting exposure light; a protection film formed on the multilayer reflection film for protecting the multilayer reflection film; an absorber layer for absorbing the exposure light on the protection film; and a shock absorbing film formed between the absorber layer and the protection film, with a resistance to etching which is performed when an exposure transfer pattern of the absorber layer is formed, in which the protection film is: a compound including Zr and Si; a compound including Zr, Si, and at least either one of O and N; or a single element or a compound including at least any one of Ru, C, and Y.

Abstract: In a reflection type photomask blank having a multilayer reflection film and a light absorption laminated layer laminated on a substrate, the light absorption laminated layer is composed by laminating a second light absorption layer having DUV light absorbing capacity and containing at least one of nitrogen and oxygen, and tantalum and silicon, on a first light absorption layer having EUV light absorbing capacity and containing tantalum and silicon.

Abstract: The invention is to develop a color polarizing plate with a support, the polarizing plate having both good brightness and polarizing efficiency for a blue channel (for blue light). The color polarizing plate with a support for a liquid crystal projector comprises a polarizing plate containing a stilbene type water-soluble azo dye as a dichroic molecule and a support, wherein the polarizing plate has an average single transmittance of 39% or more and an average crossed transmittance of 0.4% or less at 420 to 500 nm and an average crossed transmittance of 4% or more at 50 to 780 nm.

Abstract: A quartz glass substrate is placed in a DC or RF sputtering apparatus containing argon gas or oxygen gas. A zirconium compound target is reactively sputtered to form at least one halftone film made of a zirconium compound target on the substrate, thereby forming a blank for a halftone phase shift mask. The refractive index, the extinction coefficient, and the film thickness of the halftone film are so determined that the transmittance and the reflectance to exposure light are 2 to 15% and 30% or less, respectively, and the transmittance to inspection light is 30% or less.

Abstract: A polarizing film-integrated transparent electrically conductive film, wherein a polysulfone film as a support layer is laminated on at least one surface of a polyvinylalcohol polarizing film which has been dyed with a water-soluble disazo compound as a free acid represented by the general formula (1) ##STR1## wherein X represents nitro group or amino group, A represents the formula (a) or (b) ##STR2## (wherein R.sub.1 represents hydrogen atom, methoxy group, ethoxy group, methyl group or hydroxyl group, R.sub.2 represents hydrogen atom, methyl group, methoxy group, ethoxy group, acetylamino group or ureido group, R.sub.3 represents hydrogen atom, methoxy group or ethoxy group, and n is 0 or 1), and Y represents amino group, methylamino group, acetylamino group, N-methyl-N-acetylamino group, .beta.

Abstract: A novel reactive disazo dyestuff of which the free acid form is represented by the formula ##STR1## wherein R.sub.1 represents hydrogen or carboxyl, R.sub.1 and R.sub.2 represent hydrogen or sulfo, either one of the R.sub.2 and R.sub.3 being hydrogen and the other being sulfo, and when R.sub.1 is hydrogen, Y represents 2,5-dicarboxy-1,4-phenylene, 5-carboxyl-1,3-phenylene, or 2-carboxy-1,4-phenylene, and when R.sub.1 is carboxyl, Y represents 1,4-phenylene, 1,3-phenylene, or 2-carboxy-1,4-phenylene which dye cellulosic fibers with excellent color-value and build-up property.

Abstract: The present invention relates to a process for dyeing cellulose fibers or its union fibers which is effected according to an exhaustion dyeing method using a reactive dye containing at least one s-triazinyl group having a group of the formula: ##STR1## wherein M represents a hydrogen or an alkali metal, in an aqueous dyeing bath having a pH in the range of 4 to 10 and a dyeing temperature in the range of 110.degree. C. to below 140.degree. C.