Patents by Inventor Tadashi MITSUNAGA

Tadashi MITSUNAGA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mounting table system, substrate processing apparatus, and temperature control method
    Patent number: 10325801
    Abstract: There is provided a mounting table system which includes: a mounting table rotatably installed so as to mount a substrate thereon; a plurality of heating parts installed in the mounting table, and configured to heat the mounting table; a single power source configured to supply an electric power to the plurality of heating parts; and a power switching part configured to switch from a first heating part among the plurality of heating parts to which the electric power is supplied from the single power source, to a second heating part among the plurality of heating parts, depending on a rotational angle of the mounting table.
    Type: Grant
    Filed: May 15, 2017
    Date of Patent: June 18, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tadashi Mitsunaga, Tetsuya Miyashita, Tatsuo Hatano, Naoki Watanabe
  • Vacuum exhaust method
    Patent number: 10014145
    Abstract: A vacuum exhaust method is for decreasing a pressure in a processing chamber in which a mounting table configured to mount thereon a substrate is provided by using a gas exhaust unit. The vacuum exhaust method includes mounting a non-evaporated getter (NEG) on the mounting table, and adsorbing an active gas in the processing chamber on the NEG mounted on the mounting table. In the adsorbing the active gas, the NEG is maintained at a predetermined temperature.
    Type: Grant
    Filed: May 15, 2017
    Date of Patent: July 3, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tomohiro Saito, Tadashi Mitsunaga, Kouji Maeda, Tetsuya Miyashita
  • VACUUM EXHAUST METHOD
    Publication number: 20170345609
    Abstract: A vacuum exhaust method is for decreasing a pressure in a processing chamber in which a mounting table configured to mount thereon a substrate is provided by using a gas exhaust unit. The vacuum exhaust method includes mounting a non-evaporated getter (NEG) on the mounting table, and adsorbing an active gas in the processing chamber on the NEG mounted on the mounting table. In the adsorbing the active gas, the NEG is maintained at a predetermined temperature.
    Type: Application
    Filed: May 15, 2017
    Publication date: November 30, 2017
    Inventors: Tomohiro SAITO, Tadashi MITSUNAGA, Kouji MAEDA, Tetsuya MIYASHITA
  • MOUNTING TABLE SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND TEMPERATURE CONTROL METHOD
    Publication number: 20170330787
    Abstract: There is provided a mounting table system which includes: a mounting table rotatably installed so as to mount a substrate thereon; a plurality of heating parts installed in the mounting table, and configured to heat the mounting table; a single power source configured to supply an electric power to the plurality of heating parts; and a power switching part configured to switch from a first heating part among the plurality of heating parts to which the electric power is supplied from the single power source, to a second heating part among the plurality of heating parts, depending on a rotational angle of the mounting table.
    Type: Application
    Filed: May 15, 2017
    Publication date: November 16, 2017
    Inventors: Tadashi MITSUNAGA, Tetsuya MIYASHITA, Tatsuo HATANO, Naoki WATANABE