Abstract: A method of manufacturing a semiconductor device including word lines of memory cells and a pair of select gate lines. A first insulating film, a first conductive film, a second insulating film, and a first resist are sequentially formed above a semiconductor substrate. The first resist includes first patterns formed in a first region above the second insulating film and having almost the same width and interval as those of the word lines, and second patterns formed in a second region adjacent to the first region above the second insulating film with a width substantially equal to the sum of the widths of the select gate lines and the interval of the select gate lines. The second and the first conductive films are patterned to form the word lines. A second resist is used to pattern the second insulating film and the first conductive film to form the select gate lines.

Abstract: A semiconductor device manufacturing method including forming at least a first conductive film and a first insulting film above a semiconductor substrate, forming a plurality of first resist patterns above the first insulating film periodically at first intervals, patterning at least the first insulting film by use of the first resist patterns to form a plurality of mask patterns, each of the mask patterns including the first insulating film, selectively forming a second resist pattern in a space between the mask patterns in such a manner that the second resist pattern is formed in the space corresponding to a region where a second wiring structure wider than the first wiring structure is to be formed, and patterning the first conductive film by use of the second resist pattern and the mask patterns.

Abstract: A semiconductor device manufacturing method including forming at least a first conductive film and a first insulting film above a semiconductor substrate, forming a plurality of first resist patterns above the first insulating film periodically at first intervals, patterning at least the first insulting film by use of the first resist patterns to form a plurality of mask patterns, each of the mask patterns including the first insulating film, selectively forming a second resist pattern in a space between the mask patterns in such a manner that the second resist pattern is formed in the space corresponding to a region where a second wiring structure wider than the first wiring structure is to be formed, and patterning the first conductive film by use of the second resist pattern and the mask patterns.

Abstract: A plurality of first wiring structures of a first width are arranged periodically at first intervals. A second wiring structure is formed next to one of the first wiring structures. The lower part of the second wiring structure has a second width substantially equal to the sum of n times the first width of the first wiring structure (n is a positive integer equal to two or more) and (n?1) times the first interval.

Abstract: A plurality of first wiring structures of a first width are arranged periodically at first intervals. A second wiring structure is formed next to one of the first wiring structures. The lower part of the second wiring structure has a second width substantially equal to the sum of n times the first width of the first wiring structure (n is a positive integer equal to two or more) and (n?1) times the first interval.

Abstract: A plurality of first wiring structures of a first width are arranged periodically at first intervals. A second wiring structure is formed next to one of the first wiring structures. The lower part of the second wiring structure has a second width substantially equal to the sum of n times the first width of the first wiring structure (n is a positive integer equal to two or more) and (n?1) times the first interval.

Abstract: A plurality of first wiring structures of a first width are arranged periodically at first intervals. A second wiring structure is formed next to one of the first wiring structures. The lower part of the second wiring structure has a second width substantially equal to the sum of n times the first width of the first wiring structure (n is a positive integer equal to two or more) and (n?1) times the first interval.

Abstract: A plurality of first wiring structures of a first width are arranged periodically at first intervals. A second wiring structure is formed next to one of the first wiring structures. The lower part of the second wiring structure has a second width substantially equal to the sum of n times the first width of the first wiring structure (n is a positive integer equal to two or more) and (n−1) times the first interval.

Abstract: A semiconductor inspecting system extracts a region to be inspected from a design data of a semiconductor device and divides the region by a lattice to prepare lattice regions; derives a numerical value indicative of a design characteristic of the design data every one of the lattice regions to prepare a design characteristic item data; prepares a characteristic classification data by classifying the design characteristic item data into a desired number of groups; extracts the lattice regions at random from the characteristic classification data at a constant sampling rate; acquires a defect inspection data by actually inspecting a pattern of the extracted lattice regions processed on the basis of the design data; and calculates the number of defects in the whole region to be inspected on the basis of the defect inspection data, the characteristic classification data and the sampling rate.

Abstract: A substrate inspecting system comprising a design data processing part, a statistical processing and neural network processing part, an inspection region sampling part and a numerical operation part is used for extracting an inspected object region serving as an object to be inspected, from a design data, to divide the inspected object region by a lattice of an optional size to prepare lattice regions, to derive a numerical value indicative of a design characteristic of the design data every one of the lattice regions to prepare a design characteristic item data, to classify the design characteristic item data into a desired number of groups to prepare a characteristic classification data, to extract lattice regions at random from the characteristic classification data at a constant sampling rate with respect to the number of the lattice regions belonging to each of the groups, to calculate the number of defects in the whole inspected object region on the basis of a data on defects, which is obtained by inspe

Abstract: A semiconductor inspecting method including: extracting a region to be inspected from a design data of a semiconductor device and dividing the region by a lattice to prepare lattice regions; deriving a numerical value indicative of a design characteristic of the design data every one of the lattice regions to prepare a design characteristic item data; preparing a characteristic classification data by classifying the design characteristic item data into a desired number of groups; extracting the lattice regions at random from the characteristic classification data at a constant sampling rate; acquiring a defect inspection data by actually inspecting a pattern of the extracted lattice regions processed on the basis of the design data; and calculating the number of defects in the whole region to be inspected on the basis of the defect inspection data, the characteristic classification data and the sampling rate.

Abstract: A substrate inspecting system comprising a design data processing part, a statistical processing and neural network processing part, an inspection region sampling part and a numerical operation part is used for extracting an inspected object region serving as an object to be inspected, from a design data, to divide the inspected object region by a lattice of an optional size to prepare lattice regions, to derive a numerical value indicative of a design characteristic of the design data every one of the lattice regions to prepare a design characteristic item data, to classify the design characteristic item data into a desired number of groups to prepare a characteristic classification data, to extract lattice regions at random from the characteristic classification data at a constant sampling rate with respect to the number of the lattice regions belonging to each of the groups, to calculate the number of defects in the whole inspected object region on the basis of a data on defects, which is obtained by inspe

Abstract: A clutch is provided with an input section for inputting driving force in to the clutch, an output section for outputting driving force from the clutch, a shifting device for shifting one of the input section and the output section against the other one between an engaging position where the driving force is transmitted by the engagement of the input section with the output section and a releasing position where the driving force is intercepted by releasing the one from the other; and a shock easing member provided to at least one of the input section and the output section, for ease shock caused by the shifting.

Abstract: In a rotation detection apparatus, a magnetism pattern section provided with plural magnetic poles and a FG (frequency generating) pattern section provided with plural toothed wire circuits are located so as to face each other. When either one of the magnetism pattern section and the FG pattern section is rotated together with a rotating member, plural wave signals are electrically induced in the plural toothed wire circuits. A signal processing cicuit synthesizes the plural wave signals so as to output a multiplication signal and detects the rotation of the rotating member based on the multiplication signal.

Abstract: An image forming apparatus having a rotational body. The apparatus includes: the rotating body such as a photoreceptor drum; a driver for driving the rotating body; the first member, provided in a driving transmission path of the driving force, for transmitting the driving force from the driving source to the rotating body, and for elastically deforming itself so as to control a natural frequency value of a driving system including the rotating body and driving source; and the second member, provided in the driving transmission path of the driving force, for controlling damping characteristics of the driving system.

Abstract: A developer in use with an image forming apparatus. The developer includes: a developing sleeve which rotates and holds toner on itself so as to develop a latent image on a photoreceptor with the toner; a driving motor for generating a rotational driving force; a drive transmission for transmitting the rotational driving force of the driving motor to the developing cartridge in which the drive transmission has a transmitting state and an untransmitting state; and a shock easing controller or member for easing a shock of transmission of the rotational driving force to the developing sleeve in the transmitting state, in which the shock easing controller or member is provided in at least one of the driving means and the drive transmission means.

Abstract: An image forming apparatus for forming an image on an image forming body by scanning a plurality of modulated laser beams is disclosed. The apparatus is provided with a generator to generate a plurality of reference signals each with a differrent phase from other reference signals, a detector for detecting the difference of image density between two adjacent image pixels, combined modulator to generate a modulated laser beam by combining a selected laser beam, a selected reference signal and the image density. The detector classifies each pixel as one of an edge starting pixel, an edge ending pixel, and a non-edge pixel based on the value of image density difference relative to positive and negative threshold values. The selection of the laser beam and the reference signal is based on the image density difference detected by the detector and the class of the pixel.

Abstract: An image forming apparatus for forming a toner image. The apparatus includes: a photoreceptor drum, having a side surface and a circumferential surface, for forming an image on the circumferential surface: a driving means for driving the photoreceptor drum; a sliding member for decreasing steady state speed fluctuations of the photoreceptor drum; and an elastic member for pressing the sliding member onto the side surface of the photoreceptor drum.

Abstract: A proper frequency of a driving system is shifted to a high frequency side by increasing the rigidity of a photoreceptor drum or the proper frequency of the driving system is shifted to a low frequency side by reducing the rigidity of the photoreceptor drum so that the proper frequency of the driving system is made so as not to conform with a frequency of a speed fluctuation component transmitted to the driving system. With this construction, the photoreceptor drum is prevented from causing the resonance and the speed fluctuation is reduced so that an image quality can be improved.

Abstract: In a color image forming apparatus, an image retainer, a charger, a plurality of developing devices and a cleaner are made in one unit. The unit is dismountably supported in a housing so that the unit can be moved out from a first position at which the unit is set in the housing to a second position at which jam disposition is conducted. When the unit means is placed at the second position, a part of the apparatus is used to cover the image retaining surface at the transfer section.