Abstract: An exposure apparatus includes (i) a projection optical system, (ii) a substrate stage having a substrate holder on which a substrate is held, which is movable while holding the substrate with the substrate holder, and (iii) a reference member having a first reference and a second reference for performing an alignment process, the reference member being provided on the substrate stage. At least part of an upper surface of the reference member includes a liquid repellent material. The substrate is aligned based on information obtained from the alignment process. The substrate is exposed through liquid in a liquid immersion area formed locally on an upper surface of the substrate.

Abstract: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

Abstract: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.

Abstract: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

Abstract: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

Abstract: A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member having a measurement portion covered with a light-transmissive material; a first alignment system by which an alignment mark is detected not through the immersion liquid; and a second alignment system which optically obtains, using the measurement member, first positional information of the beam projected by the projection system through the immersion liquid. In order to obtain the first positional information, the movable stage is moved so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.

Abstract: An exposure apparatus includes a mask-moving section movable in a first direction while holding a mask formed with a pattern; an illumination system which forms first and second illumination areas separated each other by a spacing distance in the first direction; a substrate-moving section movable in a second direction while holding a photosensitive substrate; a projection optical system which forms first and second projected images of the patterns of the first and second illumination areas; and a restricting section which restricts the first and second projected images to be within first and second projection areas respectively. A spacing distance between a first conjugate area with the first projection area and a second conjugate area with the second projection area is set to be such a spacing distance that scanning exposures are successively performed for first and second transfer areas provided adjacently in the second direction.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member.

Abstract: A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member having a measurement portion covered with a light-transmissive material; a first alignment system by which an alignment mark is detected not through the immersion liquid; and a second alignment system which optically obtains, using the measurement member, first positional information of the beam projected by the projection system through the immersion liquid. In order to obtain the first positional information, the movable stage is moved so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

Abstract: An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.

Abstract: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

Abstract: An exposure apparatus includes a mask-moving section movable in a first direction while holding a mask formed with a pattern; an illumination system which forms first and second illumination areas separated each other by a spacing distance in the first direction; a substrate-moving section movable in a second direction while holding a photosensitive substrate; a projection optical system which forms first and second projected images of the patterns of the first and second illumination areas; and a restricting section which restricts the first and second projected images to be within first and second projection areas respectively. A spacing distance between a first conjugate area with the first projection area and a second conjugate area with the second projection area is set to be such a spacing distance that scanning exposures are successively performed for first and second transfer areas provided adjacently in the second direction.

Abstract: An exposure apparatus for efficiently exposing patterns onto corresponding regions of a substrate. The apparatus includes a first wafer stage, a second wafer stage, an alignment sensor which detects marks of wafers on the wafer stages, a projection optical system which irradiates a first region of a wafer with first exposure light, and an imperfect shot region exposure system which irradiates a second region of a wafer that differs from the first region with second exposure light. The imperfect shot region exposure system irradiates the second region of a wafer held on the second wafer stage with the second exposure light.