Patents by Inventor Tadashi Sugaya

Tadashi Sugaya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5156985
    Abstract: In making trench type semiconductor CCD by using oblique ion-injections into an oblong trench groove in a semiconductor substrate region for injecting impurity atoms, an injection angle .alpha. for injecting a first conductivity type impurity to form isolation region into the side walls and also for injecting a second conductivity type impurity to form a charge transfer region thereon is selected less than .pi./4, and another injection angle .beta. for injecting the same impurity into the end wall to form the end part of the isolation region and a third injection angle .gamma.
    Type: Grant
    Filed: May 8, 1991
    Date of Patent: October 20, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takahiro Yamada, Tadashi Sugaya
  • Patent number: 5091013
    Abstract: A pigment (or body) composed of particles having surfaces covered with a high molecular substance containing a group of the formula --COOR, where R stands for a hydrogen or metal atom, and having an acid value of at least 200 when the R in the formula stands for a hydrogen atom. It has a high power of absorbing and holding moisture. The surfaces of the pigment particles are alternatively covered with both such a high molecular substance and a substance which makes the surfaces hydrophobic. This pigment has a good affinity for oil and yet a high power of absorbing and holding moisture. A cosmetic containing any such pigment has a high moisturizing power and provides a long makeup life.
    Type: Grant
    Filed: August 3, 1989
    Date of Patent: February 25, 1992
    Assignee: Miyoshi Kasei Co., Ltd.
    Inventors: Ryota Miyoshi, Isao Imai, Tadashi Sugaya
  • Patent number: 4945068
    Abstract: The invention is intended to form a thin tunnel oxide film and a thick gate oxide film simultaneously on the silicon substrate surface, by making use of the difference in the rate of oxidation between the surface of nitrogen ion injection region and the surface of injection-free region of the silicon substrate. For this purpose, nitrogen ions are injected into the area for forming the tunnel region in the silicon substrate surface, and then oxidizing the silicon substrate. Accordingly, the stress in the boundary portion between the tunnel oxide film and gate oxide film is greatly alleviated, and the number of times for rewriting data may be greatly enhanced.
    Type: Grant
    Filed: October 25, 1989
    Date of Patent: July 31, 1990
    Assignee: Matsushita Electronics Corporation
    Inventor: Tadashi Sugaya
  • Patent number: 4919922
    Abstract: Pigment with its surface coated with a polyolefin carrying-COOR groups (wherein R is hydrogen atom or a metal atom) is water-repellent and has very high affinity for oily cosmetic components. Cosmetic products containing said surface-treated pigment is excellent in spreadability and feeling.
    Type: Grant
    Filed: August 21, 1989
    Date of Patent: April 24, 1990
    Assignee: Miyoshi Kasei Co. Ltd.
    Inventors: Ryota Miyoshi, Isao Imai, Tadashi Sugaya