Patents by Inventor Tadashi Utaka
Tadashi Utaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9448191Abstract: An X-ray fluorescence spectrometer irradiates a measurement sample 1 with primary X rays from an X-ray source, and excites an element in the sample 1 to emit fluorescence X rays, and the primary X-rays are partially scattered as scattered X rays from the sample 1. A spectroscopic system is placed so that a first spectroscopic unit, a second spectroscopic unit, and a single X-ray detector form an optimized optical system. The first spectroscopic unit disperses the fluorescence X rays to collect the resultant X rays onto the X-ray detector. The second spectroscopic unit disperses the scattered X rays to collect the resultant X rays onto the X-ray detector. In this manner, the spectroscopic system disperses the fluorescence X rays and the scattered X rays so that the intensity of the fluorescence X rays and the intensity of the scattered X rays can be detected by the single X-ray detector 24.Type: GrantFiled: December 21, 2012Date of Patent: September 20, 2016Assignee: Techno-X Co., Ltd.Inventors: Tadashi Utaka, Koichi Muraoka
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Patent number: 8314468Abstract: A silicon drift detector (SDD) comprising electrically isolated rings. The rings can be individually biased doped rings. One embodiment includes an SDD with a single doped ring. Some of the doped rings may not require a bias voltage. Some of the rings can be field plate rings. The field plate rings may all use the same biasing voltage as a single outer doped ring. The ring widths can vary such that the outermost ring is widest and the ring widths decrease with each subsequent ring towards the anode.Type: GrantFiled: November 12, 2009Date of Patent: November 20, 2012Assignee: Moxtek, Inc.Inventors: Derek Hullinger, Hideharu Matsuura, Kazuo Taniguchi, Tadashi Utaka
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Publication number: 20100314706Abstract: A silicon drift detector (SDD) comprising electrically isolated rings. The rings can be individually biased doped rings. One embodiment includes an SDD with a single doped ring. Some of the doped rings may not require a bias voltage. Some of the rings can be field plate rings. The field plate rings may all use the same biasing voltage as a single outer doped ring. The ring widths can vary such that the outermost ring is widest and the ring widths decrease with each subsequent ring towards the anode.Type: ApplicationFiled: November 12, 2009Publication date: December 16, 2010Inventors: Derek Hullinger, Hideharu Matsuura, Kazuo Taniguchi, Tadashi Utaka
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Patent number: 6442236Abstract: X-ray focusing instrument is provided with an annular analyzing element and a collimator. The analyzing element has an inner periphery. The analyzing element analyzes and reflects X-ray beams incident on the inner periphery. The collimator has a surface and total reflects X-ray beams on the surface to irradiate parallel beams toward a specimen. The collimator is placed within an internal space defined by the inner periphery of the analyzing element. The analyzing element and the collimator are arranged such that the axis of the analyzing element is substantially coincident with the axis of the collimator.Type: GrantFiled: November 1, 2000Date of Patent: August 27, 2002Assignee: Ourstex Co., Ltd.Inventor: Tadashi Utaka
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Patent number: 5732120Abstract: A fluorescent X-ray analyzing apparatus includes a source of excitation (2) for irradiating a silicon-based sample (S) with primary X-rays (B2) to excite the silicon-based sample (S), a detector (4) for detecting fluorescent X-rays (B5) emitted from the silicon-based sample (S), and an analyzer (6) for analyzing elements contained in the silicon-based sample (S) based on a result of detection performed by the detector (4). The primary X-rays (B2) emitted from the source of excitation (2) have a wavelength higher than, but in the vicinity of a wavelength at an Si--K absorption edge so that generation of fluorescent X-rays (B5) of Si is suppressed to minimize a noise which would occur during detection of fluorescent X-rays (B5) of Na and Al to thereby accomplish an accurate analysis of a minute quantity of NA and Al contained in the sample (S).Type: GrantFiled: May 19, 1997Date of Patent: March 24, 1998Assignees: Rigaku Industrial Corporation, Kabushiki Kaisha ToshibaInventors: Takashi Shoji, Tadashi Utaka, Ayako Shimazaki, Kunihiro Miyazaki, Tsuyoshi Matsumura
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Patent number: 5132997Abstract: An X-ray spectroscopic analyzing apparatus which comprises a source of X-rays, a first analyzing crystal for diffracting the X-rays from the X-ray source, and a second analyzing crystal for diffracting the X-rays from the X-ray source and also for passing therethrough a diffracted X-ray component from the first analyzing crystal. The first and second analyzing crystals are so disposed and so positioned as to permit the diffracted X-ray components of different wavelengths to travel along a single path towards a sample to be analyzed. On an optical path extending between the X-ray source and the sample, a filtering means for cutting a portion of the X-rays which has a wavelength shorter than a predetermined wavelength.Type: GrantFiled: September 4, 1991Date of Patent: July 21, 1992Assignee: Rigaku Industrial CorporationInventors: Shinjiro Kojima, Tadashi Utaka
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Patent number: 4271353Abstract: An X-ray Spectroscope comprising a pair of soller slits disposed such that one end of each faces an X-ray emitting portion of a sample, a pair of total reflection mirrors disposed such that one end of each face the other end of the respective soller slits and that the reflecting surfaces thereof face each other and make a predetermined angle with respect to X-rays passed through the respective soller slits and an X-ray detector disposed at a position, at which X-rays reflected by the total reflection mirrors intersect each other. If necessary, it further provides a pair of auxiliary soller slits between the X-ray detector and the total reflection mirrors and a filter capable of absorbing only characteristic X-rays from a particular substance.Such an X-ray spectroscope has an extremely improved efficiency of detection compared to the conventional spectroscope of this kind and can also permit size reduction of the entire device.Type: GrantFiled: June 27, 1979Date of Patent: June 2, 1981Assignee: Rigaku Industrial CorporationInventors: Nobuo Ohtsuki, Eiji Yamada, Tadashi Utaka
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Patent number: 4256961Abstract: An X-ray spectroscope comprising a soller slit consisting of a number of parallel plates and disposed such that one end thereof faces an X-ray emitting portion of a sample to be analyzed and a plurality of analysing crystals or total reflection mirrors disposed parallel to one another and spaced apart from one another at a suitable interval. The analysing crystals or total reflection mirrors are orientated with their one ends directed to the other end of the soller slit and such that X-rays having passed through the soller slit are incident on them with a desired angle of incidence.Also, these analysing crystals or total reflection mirrors each have a convex back side defined by inclined surfaces respectively parallel with incident and reflected X-rays and facing the reflecting surface of the next adjacent analysing crystal or total reflection mirror.Type: GrantFiled: June 27, 1979Date of Patent: March 17, 1981Assignee: Rigaku Industrial CorporationInventors: Takashi Shoji, Tadashi Utaka