Patents by Inventor Tadasi Sonobe

Tadasi Sonobe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5502613
    Abstract: A superconducting magnet abnormality detection and protection apparatus is for early and surely detecting abnormality in superconducting coils mounted on a vehicle and protecting the superconducting coils. Magnetic flux detecting devices are mounted inside an outer vessel, which is a vacuum container of a superconducting magnet, so as to be opposite to the superconducting coil. Voltages induced in the magnetic flux detecting devices are detected. Voltage signals are led to a decision device. By monitoring the change of the voltage signals with time in a comparing judgment device, it is determined whether there is an abnormality. If there is an abnormality, an alarm indicator informs of an abnormal state, and a protection device takes protection measures such as interruption of the current of the superconducting magnet. Owing to such configuration, heat does not penetrate from the outside into the superconducting coil via instrumentation lead wires of the magnetic flux detecting devices.
    Type: Grant
    Filed: July 8, 1993
    Date of Patent: March 26, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Toshio Saitoh, Teruhiro Takizawa, Naoki Maki, Takashi Kobayashi, Masayuki Shibata, Ken Yoshioka, Tadasi Sonobe, Fumio Suzuki
  • Patent number: 5433788
    Abstract: A plasma treatment apparatus for forming a thin film on a substrate in a vacuum vessel includes a magnetic field generator which can be positioned inside or outside the vacuum vessel, and a microwave source. The magnetic field strength is controllable such that an electron cyclotron resonance (ECR) area is defined near the substrate. The magnetic field generator can be arranged so that plasma and reactive gas introduction ports are on the microwave introduction side of the ECR area and the substrate is on the opposite side of the ECR area. Alternatively, a gas introduction port can be positioned such that reactive gas is introduced into the ECR area or onto the substrate.
    Type: Grant
    Filed: October 4, 1993
    Date of Patent: July 18, 1995
    Assignees: Hitachi, Ltd., Hitachi Service Engineering Co., Ltd.
    Inventors: Yasuhiro Mochizuki, Naohiro Momma, Shigeru Takahashi, Takuya Fukuda, Noboru Suzuki, Tadasi Sonobe, Kiyoshi Chiba, Kazuo Suzuki
  • Patent number: 5424702
    Abstract: A beam member which is installed at diametral portion in a ring shape superconducting coil container for supporting hoop stress of the coil, or a portion of radiant heat shield covering the beam member, is partly or entirely composed of electrical insulators or high resistivity materials. In accordance with the above composition, eddy current which is generated in the coil container when the superconducting coil container crosses magnetic field caused by eddy current which is generated in the radiant heat shield when the radiant heat shield crosses strong magnetic field caused by the superconducting coils with relative vibration of the radiant heat shield to the superconducting coil by a dynamic cause can be suppressed. Accordingly, heat generation in the superconducting coil container can be reduced, and consequently, generation of quenching can be prevented.
    Type: Grant
    Filed: November 3, 1994
    Date of Patent: June 13, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Yoko Kameoka, Hideshi Fukumoto, Ken Yoshioka, Teruhiro Takizawa, Tadasi Sonobe, Fumio Suzuki
  • Patent number: 5400668
    Abstract: A superconducting magnet includes a superconducting coil, an inner tank for containing the coil, a shield plate for covering the inner tank, and an outer tank for accommodating the superconducting coil, the inner tank and the shield plate. The inner tank is supported on the outer tank by a load support member and the outer tank forms a vacuum vessel. At least one of the inner tank, the load support member, the shield plate and the outer tank includes a detection arrangement for detecting abnormality and/or deterioration of the inner tank, load support member, shield plate and outer tank associated with the respective detection arrangement.
    Type: Grant
    Filed: December 23, 1992
    Date of Patent: March 28, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Toshio Hattori, Hiroshi Aoyama, Saburo Usami, Toshio Ishizuki, Tosuke Hirata, Shigeru Sakamoto, Yumiko Seki, Tadasi Sonobe, Fumio Suzuki, Sueo Kawai
  • Patent number: 5343180
    Abstract: There is disclosed a coil structure which can be rapidly energized or excited, and which reduces the generation of heat in a coil container by an eddy current due to a dynamic disturbance such as vibration and a magnetic field fluctuation, thereby suppressing the occurrence a quench. The coil container is constituted by a low-resistivity material, and a high-resistivity portion is provided at at least one portion of the coil container in the direction of the periphery of the coil container. The high-resistivity portion is provided at a position where a vibration displacement is small or a magnetic field fluctuation is small. When the coil structure is to be energized or excited, the eddy current produced in the direction of the periphery of the superconducting-coil container can be reduced at the high-resistivity portion, and when the dynamic disturbance develops, the generation of heat by the eddy current is suppressed by the low-resistivity material.
    Type: Grant
    Filed: March 25, 1992
    Date of Patent: August 30, 1994
    Assignees: Hitachi, Ltd., Hitachi Engineering Co., Ltd.
    Inventors: Hideshi Fukumoto, Yoko Kameoka, Ken Yoshioka, Teruhiro Takizawa, Tadasi Sonobe, Fumio Suzuki, Naoki Kasahara, Fumihiko Goto, Shigeru Sakamoto, Masayuki Shibata
  • Patent number: 5222437
    Abstract: A levitation system of a magnetically levitated train is provided wherein superconducting magnets are installed in a car body, and the first layer and the second layer of levitation coils are so arranged as to be in a shifted location relative to each other in the moving direction of the train. By making the levitation coils two layers and by arranging the two layers in the shifted location relative to each other in the moving direction, amplitude of higher harmonic waves is reduced to a very small level, substantially to zero.
    Type: Grant
    Filed: February 18, 1992
    Date of Patent: June 29, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Masayuki Shibata, Naoki Maki, Toshio Saitoh, Takashi Kobayashi, Teruhiro Takizawa, Tadasi Sonobe, Shizuo Tsujimoto, Hideshi Fukumoto
  • Patent number: 5211825
    Abstract: A plasma processing apparatus performs a sample processing and cleaning processing. The sample processing is carried out by generating a reaction gas plasma within a vacuum vessel of the apparatus using an electron cyclotron resonance excitation. The cleaning processing is carried out to clean the inner wall of the vacuum vessel by generating a cleaning gas plasma within the vacuum vessel. Generation of the cleaning gas plasma takes place by using either one of the following processes:(1) The plasma diameter during the cleaning processing is made larger than that during the sample processing. The end of the plasma during cleaning processing is made to reach the inside wall of the vacuum vessel.(2) The cleaning gas plasma is scanned within the vacuum vessel.
    Type: Grant
    Filed: September 23, 1991
    Date of Patent: May 18, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Katsuaki Saito, Takuya Fukuda, Michio Ohue, Tadasi Sonobe
  • Patent number: 5182495
    Abstract: In a plasma processing apparatus using ECR, faces in contact with plasma excepting a substance to be processed are covered by an insulating material. By such configuration, discharge caused between the plasma and the substance to be processed in plasma processing is prevented beforehand.
    Type: Grant
    Filed: November 29, 1990
    Date of Patent: January 26, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Takuya Fukuda, Michio Ohue, Tadasi Sonobe
  • Patent number: 5177448
    Abstract: An industrial compact synchrotron radiation source includes, for the purpose of prolonging lifetime of a charged particle beam, beam absorbers made of a material having a low photodesorption yield and disposed inside a bending section/vacuum chamber at at least positions upon which the synchrotron radiation is irradiated, and electrically conductive beam stabilizers disposed at positions inside the bending section/vacuum chamber which are distant by a predetermined distance from an orbit of the charged particle beam toward the outer circumferential wall of the bending section/vacuum chamber.
    Type: Grant
    Filed: November 21, 1990
    Date of Patent: January 5, 1993
    Assignees: Hitachi, Ltd., Nippon Telegraph and Telephone Corporation, Hitachi Service Engineering Co., Ltd.
    Inventors: Takashi Ikeguchi, Manabu Matsumoto, Shinjiroo Ueda, Tadasi Sonobe, Toru Murashita, Satoshi Ido, Kazuo Kuroichi, Akinori Shibayama
  • Patent number: 5162633
    Abstract: The present invention relates to a plasma treatment apparatus for making plasma surface processing of a specimen such as thin-film formation, etching, sputtering or plasma oxidation by use of plasma produced through microwave discharge. In a specimen chamber provided with a specimen table for holding at least one specimen thereon, a microwave is introduced from a direction intersecting a magnetic line of force so as to propagate in the longitudinal direction of an ECR region or in a direction along the plane of the ECR region. Since the microwave is introduced from the transverse direction of the specimen chamber, the provision of a microwave introducing window at an upper portion of the specimen chamber is not required and hence a counter electrode for applying an electric field to the specimen can be disposed at the upper portion of the specimen chamber, thereby making it possible to apply a uniform electric field to the specimen so that the specimen is subjected to a uniform treatment.
    Type: Grant
    Filed: June 27, 1989
    Date of Patent: November 10, 1992
    Assignees: Hitachi, Ltd., Hitachi Engineering and Services Co., Ltd.
    Inventors: Tadasi Sonobe, Kazuo Suzuki, Takuya Fukuda, Michio Ohue
  • Patent number: 5036290
    Abstract: Synchrotron radiation is generated when a base of charged particles is bent by a bending magnet. The synchrotron radiation passes down a lead-out duct as the total number of pumps is limited by the size of the apparatus and many pumps are needed in order to achieve a good vacuum. An ion pump has a main magnetic field, normally generated by a magnet of the ion pump which controls the behavior of the electrons in the ion pump. However, the leakage magnetic field of the bending magnet affects the ion pump, and therefore the ion pump is arranged so that its main magnetic field is aligned with the leakage magnetic field at the ion pump, or at least with a main component thereof. In this way, the effect of the leakage magnetic field on the ion pump is reduced. Indeed, it is possible to use the leakage magnetic field as the main magnetic field of the ion pump.
    Type: Grant
    Filed: March 8, 1990
    Date of Patent: July 30, 1991
    Assignees: Hitachi, Ltd., Nippon Telegraph and Telephone Corp.
    Inventors: Tadasi Sonobe, Mamoru Katane, Takashi Ikeguchi, Manabu Matsumoto, Shinjiro Ueda, Toshiaki Kobari, Takao Takahashi, Toa Hayasaka, Toyoki Kitayama
  • Patent number: 4994753
    Abstract: An industrial compact synchrotron radiation source includes, for the purpose of prolonging lifetime of a charged particle beam, beam absorbers made of a material having a low photodesorption yield and disposed inside a bending section/vacuum chamber at at least positions upon which the synchrotron radiation is irradiated, and electrically conductive beam stabilizers disposed at positions inside the bending section/vacuum chamber which are distant by a predetermined distance from an orbit of the charged particle beam toward the outer circumferential wall of the bending section/vacuum chamber.
    Type: Grant
    Filed: March 17, 1988
    Date of Patent: February 19, 1991
    Assignees: Hitachi, Ltd., Nippon Telephone & Telegraph Corp., Hitachi Service Engineering Co., Ltd.
    Inventors: Takashi Ikeguchi, Manabu Matsumoto, Shinjiroo Ueda, Tadasi Sonobe, Toru Murashita, Satoshi Ido, Kazuo Kuroishi, Akinori Shibayama
  • Patent number: 4931744
    Abstract: A synchrotron radiation source and a method of making the same. As assembly of a beam absorber for absorbing synchrotron radiation beams and a piping for cooling the beam absorber is mounted in a charged particle beam duct of a bending section of the synchrotron radiation source for bending a charged particle beam. Fixed to at least one straight duct that is connectable to either of the opposite ends of the charged particle beam duch is a piping guide duct through which the beam absorber cooling piping is drawn to the outside, so that the assembly of the beam absorber and the beam absorber cooling piping can readily be mounted in the synchrotron radiation source.
    Type: Grant
    Filed: November 1, 1988
    Date of Patent: June 5, 1990
    Assignees: Hitachi, Ltd., Hitachi Service Engineering, Ltd.
    Inventors: Tadasi Sonobe, Shinjiro Ueda, Takashi Ikeguchi, Manabu Matsumoto, Kazuo Kuroishi
  • Patent number: 4920095
    Abstract: A superconducting energy storage device for storing electric power in superconducting magnets in the form of magnetic energy. The superconducting magnets are include a superconducting toroidal magnet and a superconducting solenoid magnet arranged to be inscribed in the inside of the superconducting toroidal magnet, the magnets being connected electrically in series to each other. Further, the superconducting magnets include a plurality of units, each of which is formed as a combination of the aforementioned toroidal and solenoid superconducting magnets, the units being piled up in the axial direction of the superconducting solenoid magnet. In the thus arranged device, electromagnetic force generated in the superconducting magnets can be supported without the necessity of firm bed rock, thereby eliminating the limitation in conditions of location of the energy storage device. Further, the plurality of energy storage units can be arranged effectively so that space can be saved.
    Type: Grant
    Filed: July 25, 1988
    Date of Patent: April 24, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Yukio Ishigaki, Tadasi Sonobe
  • Patent number: 4876983
    Abstract: A plasma operation apparatus utilizes plasma generated by a microwave cooperative with a magnetic field as to perform a surface operation on a specimen such as semiconductor substrates, such as, for example, thin film deposition, etching, sputtering and plasma oxidation. The apparatus particularly takes advantage of electron cyclotron resonance and is suitable for performing highly efficient and high-quality plasma operations.
    Type: Grant
    Filed: January 19, 1988
    Date of Patent: October 31, 1989
    Assignees: Hitachi, Ltd., Service Engineering Co. Ltd.
    Inventors: Takuya Fukuda, Yasuhiro Mochizuki, Naohiro Momma, Shigeru Takahashi, Noboru Suzuki, Tadasi Sonobe, Kiyosi Chiba, Kazuo Suzuki
  • Patent number: 4853640
    Abstract: An industrial compact synchrotron radiation source which can improve vacuum evacuation performance to prolong life-time of a charged particle beam and supply highly intensive stable synchrotron radiation. In the source, a charged particle beam bending duct forming a vacuum chamber through which the charged particle beam circulates is encompassed by a bending electromagnet, and at least one SR guide duct for guiding the radiation to outside extends from the outer circumferential wall of the bending duct. The SR guide duct is connected through a gate valve to an SR beam line duct for guiding the SR beam to an object to be worked and a vacuum pump is disposed on the side, close to an orbit of the charged particle beam, of the gate valve. The SR guide duct extending from the outer circumferential wall of the bending duct takes a form of a divergent duct which is widened in accordance with a spreading angle of the SR beam traveling through the SR guide duct.
    Type: Grant
    Filed: February 11, 1988
    Date of Patent: August 1, 1989
    Assignees: Hitachi, Ltd., Nippon Telephone & Telegraph, Hitachi Service Engineering, Ltd.
    Inventors: Manabu Matsumoto, Takashi Ikeguchi, Shinjiroo Ueda, Tadasi Sonobe, Toru Murashita, Satoshi Ido, Kazuo Kuroishi, Yoshiaki Kazawa, Shunji Kakiuchi, Toshiaki Kobari
  • Patent number: 4128780
    Abstract: A rotor for use with rotary electric machinery, which includes a rotary shaft, a rotor core disposed around the rotary shaft and consisting of a plurality of silicon steel plates laminated to a predetermined thickness in the axial direction of the rotary shaft, a plurality of mounts secured to the rotor core by means of dove-tail joints as well as by welding and disposed on the inner circumferential surface of the rotor core plurality sets of arms, each set consisting of at least two arms whose one ends are connected to the mounts by welding, and whose other ends are connected to the rotary shaft by welding, said arms being inclined or curved to the radial direction in cross section perpendicular to the axial direction of the rotary shaft.
    Type: Grant
    Filed: September 22, 1976
    Date of Patent: December 5, 1978
    Assignee: Hitachi, Ltd.
    Inventor: Tadasi Sonobe