Patents by Inventor Tadataka Horishita

Tadataka Horishita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for forming thin oxide film
    Patent number: 5106821
    Abstract: A process for forming a thin oxide film on an underlying surface adapted for film formation thereon according to a radio frequency magnetron sputtering method using an oxide target(s). The excitation frequency is higher than 13.56 MHz and provides a lower negative target self-bias voltage permitting improved film formation.
    Type: Grant
    Filed: September 10, 1990
    Date of Patent: April 21, 1992
    Assignees: International Superconductivity Technology Center, OKI Electric Industry Co., Ltd., The Hokkaido Electric Power Company Inc., The Chugoku Electric Power Co., Inc., Mitsubishi Metal Corporation
    Inventors: Norio Homma, Hiromi Takahashi, Shinji Kawamoto, Hideyuki Kondo, Tadataka Horishita