Patents by Inventor Tadatsugu Itoh

Tadatsugu Itoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4823174
    Abstract: A bipolar transistor comprising a first layer of a first semiconductor material having a first conductivity type, a second layer on the first layer, the second layer being of a second semiconductor material having a second conductivity type, the second semiconductor material having a bandgap less than that of the first semiconductor material, a third layer on the second layer, the third layer being of the second semiconductor material and having the first conductivity type, a first doped region in the first layer, the first doped region being of the first semiconductor material and being doped to be semi-insulating regions, and a second doped region in the third layer, the second doped region being of the second semiconductor material and being doped to the second conductivity type. The second layer has a portion forming an active base region and the third layer has a portion forming a collector region in contact with the active base region.
    Type: Grant
    Filed: June 8, 1988
    Date of Patent: April 18, 1989
    Assignee: NEC Corporation
    Inventors: Tadatsugu Itoh, Hideaki Kohzu, Yasuhiro Hosono
  • Patent number: 4499415
    Abstract: A battery rapid charging circuit is disclosed which includes a DC power source supplying a DC voltage across first and second terminals between which a battery to be charged is connected, a circuit element for short-circuiting the first and second terminals in a short period of time during a charging period of the battery, a comparator for comparing a terminal voltage of the battery upon the above short-circuiting period with a reference voltage, and a circuit element for stopping the supply of the DC voltage across the first and second terminals in response to the output of the comparator.
    Type: Grant
    Filed: December 6, 1982
    Date of Patent: February 12, 1985
    Assignee: Minicam Research Corporation
    Inventor: Tadatsugu Itoh
  • Patent number: 4389573
    Abstract: In a gas-filled space, a pulsed electron beam device comprises a cathode provided with through holes, a filament on one side of the cathode, and an anode on the other side with a sample to be processed held thereon. Electrons emitted by the filament are momentarily directed to the cathode so that a portion thereof may trigger a discharge in a space between the anode and cathode. The discharge ceases in a moment, meanwhile providing electron beams to uniformly process the sample. The cathode may comprise either a single plate of graphite or a combination of a graphite plate and an aluminum plate. Preferably, a net electrode is placed between the cathode and the anode and electrically connected to the anode.
    Type: Grant
    Filed: February 12, 1981
    Date of Patent: June 21, 1983
    Assignee: Anelva Corporation
    Inventor: Tadatsugu Itoh