Abstract: [Problem] The provision of a cleaning apparatus that is useful in the cleaning of an original plate that is used when forming a pattern on top of a substrate. [Means for solving the problem] A cleaning apparatus configured to clean an original plate that is used when forming a pattern in an imprint material on top of a substrate; wherein the cleaning apparatus comprises an irradiating unit configured to release plasma onto a first side of the original plate; and a heating unit configured to radiate heat onto a second side of the original plate, and heat the original plate; and wherein the irradiating unit and the heating unit are disposed such that the original plate is interposed between the irradiating unit and the heating unit.

Abstract: The present invention provides an imprint method of performing a forming process which includes supplying an imprint material on a substrate and then forming a pattern of the imprint material on the substrate by using a mold, the method comprising: dispensing, on the substrate, an adhesion material to bring the substrate and the imprint material into tight contact with each other; performing a first annealing process of heating and cooling the substrate on which the adhesion material has been dispensed; conveying the substrate to which the first annealing process has been performed; performing a second annealing process of heating and cooling the substrate which has been conveyed in the conveying; and performing the forming process on the substrate to which the second annealing process has been performed.

Abstract: The present invention provides an imprint method of performing a forming process which includes supplying an imprint material on a substrate and then forming a pattern of the imprint material on the substrate by using a mold, the method comprising: dispensing, on the substrate, an adhesion material to bring the substrate and the imprint material into tight contact with each other; performing a first annealing process of heating and cooling the substrate on which the adhesion material has been dispensed; conveying the substrate to which the first annealing process has been performed; performing a second annealing process of heating and cooling the substrate which has been conveyed in the conveying; and performing the forming process on the substrate to which the second annealing process has been performed.

Abstract: A positioning apparatus comprises a first measuring device measuring a position of the stage in a first measuring range, a second measuring device measuring a position of the stage in a second measuring range having an overlapping range overlapping the first measuring range, a third measuring device measuring a position of the stage in the overlapping range, and a controller controlling the first measuring device to take over the measurement value obtained by the second measuring device in the overlapping range in moving the stage from the second measuring range to the first measuring range, thereby switching from measurement by the second measuring device to measurement by the first measuring device. The controller performs correction processing based on the measurement by the third measuring device so as to reduce an error of the measurement value obtained by the first measuring device after the switching.

Abstract: An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.

Abstract: A positioning apparatus comprises a first measuring device measuring a position of the stage in a first measuring range, a second measuring device measuring a position of the stage in a second measuring range having an overlapping range overlapping the first measuring range, a third measuring device measuring a position of the stage in the overlapping range, and a controller controlling the first measuring device to take over the measurement value obtained by the second measuring device in the overlapping range in moving the stage from the second measuring range to the first measuring range, thereby switching from measurement by the second measuring device to measurement by the first measuring device. The controller performs correction processing based on the measurement by the third measuring device so as to reduce an error of the measurement value obtained by the first measuring device after the switching.

Abstract: The present invention is relative with an objective lens driving device used in an optical pickup device, and includes a stationary unit, a lens bobbin provided with an objective lens, at least one magnet provided on one of the lens bobbin and the stationary unit, a coil unit provided on the other of the lens bobbin and the stationary unit for causing movement of the lens bobbin in a direction parallel to the optical axis of the objective lens and in a planar direction perpendicular to the optical axis of the objective lens, and an elastic supporting unit of a stainless material, provided between a stationary unit and the lens bobbin. The elastic supporting unit supports the lens bobbin for movement in a direction parallel to the optical axis of the objective lens and in a planar direction perpendicular to the optical axis of the objective lens.

Abstract: An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.

Abstract: The present invention is relative with an objective lens driving device used in an optical pickup device, and includes a stationary unit, a lens bobbin provided with an objective lens, at least one magnet provided on one of the lens bobbin and the stationary unit, a coil unit provided on the other of the lens bobbin and the stationary unit for causing movement of the lens bobbin in a direction parallel to the optical axis of the objective lens and in a planar direction perpendicular to the optical axis of the objective lens, and an elastic supporting unit of a stainless material, provided between a stationary unit and the lens bobbin. The elastic supporting unit supports the lens bobbin for movement in a direction parallel to the optical axis of the objective lens and in a planar direction perpendicular to the optical axis of the objective lens.