Patents by Inventor Tadayoshi Ikehara

Tadayoshi Ikehara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8684549
    Abstract: An illumination device includes: a substrate; a first transparent electrode covering approximately an entire surface of a display region of the substrate; a second transparent electrode which overlaps with the first transparent electrode when seen in plan view and covers approximately the entire surface of the display region; and a plurality of island shaped light emitting elements disposed between the first transparent electrode and the second transparent electrode. The first and second transparent electrodes are formed as single continuous films.
    Type: Grant
    Filed: June 18, 2012
    Date of Patent: April 1, 2014
    Assignee: Seiko Epson Corporation
    Inventors: Norio Koma, Kenji Tanase, Yasushi Karasawa, Tadayoshi Ikehara
  • Publication number: 20120256207
    Abstract: An illumination device includes: a substrate; a first transparent electrode covering approximately an entire surface of a display region of the substrate; a second transparent electrode which overlaps with the first transparent electrode when seen in plan view and covers approximately the entire surface of the display region; and a plurality of island shaped light emitting elements disposed between the first transparent electrode and the second transparent electrode. The first and second transparent electrodes are formed as single continuous films.
    Type: Application
    Filed: June 18, 2012
    Publication date: October 11, 2012
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Norio KOMA, Kenji TANASE, Yasushi KARASAWA, Tadayoshi IKEHARA
  • Patent number: 8220943
    Abstract: An illumination device includes: a substrate; a first transparent electrode covering approximately an entire surface of a display region of the substrate; a second transparent electrode which overlaps with the first transparent electrode when seen in plan view and covers approximately the entire surface of the display region; and a plurality of island shaped light emitting elements disposed between the first transparent electrode and the second transparent electrode. The first and second transparent electrodes are formed as single continuous films.
    Type: Grant
    Filed: March 3, 2010
    Date of Patent: July 17, 2012
    Assignee: Seiko Epson Corporation
    Inventors: Norio Koma, Kenji Tanase, Yasushi Karasawa, Tadayoshi Ikehara
  • Publication number: 20100231825
    Abstract: An illumination apparatus includes: a substrate; reflective layers formed upon the substrate; and light-emitting layers formed upon respective reflective layers and disposed so as to overlap the respective reflective layers when viewed from above. The reflective layers are formed in a convex shape protruding toward the respective light-emitting layers, and when reflecting light irradiated from the light-emitting layers, diffuse and reflect the light.
    Type: Application
    Filed: March 8, 2010
    Publication date: September 16, 2010
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Norio KOMA, Kenji TANASE, Yasushi KARASAWA, Tadayoshi IKEHARA
  • Publication number: 20100226120
    Abstract: An illumination device includes: a substrate; a first transparent electrode covering approximately an entire surface of a display region of the substrate; a second transparent electrode which overlaps with the first transparent electrode when seen in plan view and covers approximately the entire surface of the display region; and a plurality of island shaped light emitting elements disposed between the first transparent electrode and the second transparent electrode. The first and second transparent electrodes are formed as single continuous films.
    Type: Application
    Filed: March 3, 2010
    Publication date: September 9, 2010
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Norio KOMA, Kenji TANASE, Yasushi KARASAWA, Tadayoshi IKEHARA
  • Patent number: 7771789
    Abstract: A method of forming a mask, in which a film pattern is formed on a substrate by using a mask, includes sequentially arranging the mask, the substrate and a first member having a flat surface contacting with the substrate in this order from a supply source of film forming material; and attracting the mask and the first member by means of a magnetic force.
    Type: Grant
    Filed: January 4, 2006
    Date of Patent: August 10, 2010
    Assignee: Seiko Epson Corporation
    Inventors: Shinichi Yotsuya, Hiroshi Koeda, Takayuki Kuwahara, Tadayoshi Ikehara
  • Publication number: 20060148114
    Abstract: A method of forming a mask, in which a film pattern is formed on a substrate by using a mask, includes sequentially arranging the mask, the substrate and a first member having a flat surface contacting with the substrate in this order from a supply source of film forming material; and attracting the mask and the first member by means of a magnetic force.
    Type: Application
    Filed: January 4, 2006
    Publication date: July 6, 2006
    Inventors: Shinichi Yotsuya, Hiroshi Koeda, Takayuki Kuwahara, Tadayoshi Ikehara
  • Publication number: 20050211981
    Abstract: A mask is provided including a supporting substrate, and a plurality of chips attached to the supporting substrate. Each chip has an opening corresponding to at least a part of a shape of a thin film pattern formed on a given surface. The area occupied by each chip is smaller than an area of the thin film pattern using the plurality of chips.
    Type: Application
    Filed: March 8, 2005
    Publication date: September 29, 2005
    Inventors: Shinichi Yotsuya, Takayuki Kuwahara, Tadayoshi Ikehara
  • Patent number: 6873054
    Abstract: A through hole tapered from an opening to the in-depth direction is formed in a semiconductor substrate provided with an integrated circuit. An insulating material is supplied to the through hole through the opening so as to form an insulating layer on the inner surface of the through hole. A conductive material is supplied through the opening to the through hole provided with the insulating layer so as to form a conductive portion inside the insulating layer.
    Type: Grant
    Filed: April 17, 2003
    Date of Patent: March 29, 2005
    Assignee: Seiko Epson Corporation
    Inventors: Ikuya Miyazawa, Tadayoshi Ikehara
  • Publication number: 20040016942
    Abstract: A through hole tapered from an opening to the in-depth direction is formed in a semiconductor substrate provided with an integrated circuit. An insulating material is supplied to the through hole through the opening so as to form an insulating layer on the inner surface of the through hole. A conductive material is supplied through the opening to the through hole provided with the insulating layer so as to form a conductive portion inside the insulating layer.
    Type: Application
    Filed: April 17, 2003
    Publication date: January 29, 2004
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Ikuya Miyazawa, Tadayoshi Ikehara