Abstract: A film F in the form of a belt which is provided in a manner to be fed out and wound up is wound on a trap roller 11 which is provided opposite to a blanket 4 of a blanket wheel 3 via a contacting and withdrawing mechanism 12. The film F is caused to contact the blanket 4 to remove surplus ink or blurring ink. By this arrangement, ink trap can be made by contacting an always clean film and ink trap can also be made with a simple mechanism for contacting and withdrawing the trap roller.

Abstract: A film F in the form of a belt which is provided in a manner to be fed out and wound up is wound on a trap roller 11 which is provided opposite to a blanket 4 of a blanket wheel 3 via a contacting and withdrawing mechanism 12. The film F is caused to contact the blanket 4 to remove surplus ink or blurring ink. By this arrangement, ink trap can be made by contacting an always clean film and ink trap can also be made with a simple mechanism for contacting and withdrawing the trap roller.

Abstract: In a photomask according to the present invention, an attenuating film is formed on one major surface of a transparent glass substrate. The attenuating film has an opening, in which a phase-shifting film is formed. A non-transparent film for shutting out incident light is formed a portion of the attenuating film while being contiguous with the phase-shifting film. Thus, the intensity of light through the attenuating film substantially coincides with the intensity of the phase-shifting film. As a result, the peak intensity passing through the photomask becomes constant.