Abstract: A positive working light-sensitive composition which comprises:(a) 10 to 95% by weight of a compound which has at least one acid-decomposable group and whose solubility in an alkaline developer increases by the action of an acid,(b) 0.01 to 20% by weight of a disulfone compound represented by the formula (I):R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I)wherein R.sup.1 and R.sup.2 may be same or different and represent substituted or unsubstituted alkyl groups, substituted or unsubstituted alkenyl groups or substituted or unsubstituted aryl groups, and(c) 3 to 85% by weight of a water-insoluble but alkaline water-soluble resin,wherein the optical density at 248 nm of 1 .mu.m thick coating of the composition is not more than 1.4 and the optical density at 248 nm of the coating exposed to light of 248 nm is less than the optical density of the coating before exposed to light.The light-sensitive composition is highly responsive to light of Deep-UV regions and excellent in image resolution.

Abstract: A positive photoresist composition containing the combination of at least one alkali-soluble novolak resin and at least one light-sensitive compound represented by formula (I): ##STR1## wherein each of R.sub.1 to R.sub.10, which may be the same or different, represents hydrogen, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkylester group, a substituted or unsubstituted arylester group, a substituted or unsubstituted aralkylester group, a substituted or unsubstituted alkylsulfonylester group, a substituted or unsubstituted arylsulfonylester group, ##STR2## provided that at least one of R.sub.1 to R.sub.10 represents ##STR3## where R.sub.17 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; and at least two of R.sub.1 to R.sub.

Abstract: A positive photoresist developer containing a basic compound and from 10 to 10,000 ppm of a non-ionic surfactant represented by formula (I): ##STR1## wherein X represents an oxyethylene group; Y represents an oxypropylene group; R represents hydrogen, an alkyl group containing from 1 to 8 carbon atoms, R', or ##STR2## R' represents --O--(X).sub.m (Y).sub.n --H; R" represents R' of an alkyl group containing l carbon atoms; m and n each is an integer from 1 to 50, provided that m:n is from 20:80 to 80:20; p is 0 or 1, and q and s each is o or an integer from 1 to 4, provided that p+q+s=4; and l is an integer from 1 to 4; and r is an integer from 1 to 8, provided that l+r is an integer of 9 or more. The developer has superior art in forming properties, and prevents film residues, surface layer peeling, and film reduction.

Abstract: A positive-working photoresist composition containing an alkali-soluble novolak resin and a photosensitive compound represented by the formula ##STR1## wherein D.sub.1 and D.sub.2, which may be the same or different, each represents a 1,2-naphthoquinonediazido-5-sulfonyl group or a 1,2-naphthoquinonediazido-4-sulfonyl group; R.sub.1 and R.sub.2, which may be the same or different, each represents an alkoxy group, or an alkyl ester group; and a, b, c, and d each is 0 or an integer from 1 to 5, provided that (a+b).gtoreq.1 and (c+d).gtoreq.1.The photoresist composition is excellent in sensitivity and resolving power and forms a resist pattern having good sectional shape and high heat resistance on, for example, a semiconductor. The photoresist composition is also applicable for forming a resist pattern having a line width of less than 1 .mu.m.

Abstract: A positive-working photoresist composition is disclosed. The composition comprises a light-sensitive compound represented by general formula (A) and an alkali-soluble novolak resin. ##STR1## wherein R.sub.a, R.sub.b, R.sub.c, R.sub.d, R.sub.e and R.sub.f, which may be the same or different, each represents H, --X--R.sub.1, ##STR2## provided that among the six substituents represented by R.sub.a to R.sub.f, the number of the substituents representing H is a real number of more than 0 and not more than 3 calculated in terms of average value per molecule of the light-sensitive compound, the number of the substituents representing --X--R.sub.1 is a real number of not less than 0.3 calculated in terms of average value per molecule of the light-sensitive compound, and the number of the substituents representing ##STR3## is a real number of not less than 2.5 caluclated in terms of average value per molecule of the light-sensitive compound; X represents a simple bond, ##STR4## R.sub.

Abstract: A positive-working photoresist composition is disclosed, which comprises a light-sensitive substance of 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3',4',5'-hexahydroxybenzophenone and an alkali-soluble novolak resin dissolved in ethyl lactate or methyl lactate.

Abstract: A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.

Abstract: A silver halide photographic light-sensitive materials are described. In silver halide photographic printing paper comprising at least one silver halide photographic emulsion layer applied to a water impermeable reflective base, the printing paper of the present invention is in the improvement wherein said silver halide emulsion layer is spectrally sensitized with at least one cyanine dye represented by general formulae I and II, and an emulsified dispersion or latex dispersion of a water insoluble fluorescent whitening agent contained in a hydrophilic vehicle of at least one layer applied to the base on the same side as said silver halide emulsion layer: ##STR1## wherein Y.sub.1 and Y.sub.2 each represents an O atom, --N--R.sub.7 or a S atom, wherein R.sub.7 represents a lower alkyl group, A represents H or a lower alkyl group having 4 or less carbon atoms, R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each represents --H, --CH.sub.3, --OCH.sub.3, --C.sub.2 H.sub.5, --OC.sub.2 H.sub.5, --CN, --Cl, --F, --CF.sub.

Abstract: An internal latent image-type silver halide emulsion containing core/shell type silver halide grains with a mean grain size of about 0.4 .mu.m or less, the grains comprising a core of chemically sensitized silver halide and a shell of silver halide covering at least the light-sensitive sites of the core and the surface of the grains being chemically sensitized wherein the core is chemically sensitized to such an extent that the difference between fog density F.sub.1 and fog density F.sub.2 as defined herein (i.e., internal fog density) is at least 0.10. This emulsion permits the formation of good reversal images in which D.sub.max is high and D.sub.min is low and, furthermore, has a superior storage stability.

Abstract: A silver halide photographic printing paper is described, comprising a support and a photographic layer containing a silver halide developing agent, wherein a dispersion of an oil-soluble brightening agent in a high boiling point organic solvent having a specific inductive capacity of 7.5 or less is contained in the photographic layer. This printing paper yields a background of high whiteness even when processed under rapid processing conditions.

Abstract: A silver halide photographic light-sensitive material is described, comprising a support and at least one silver halide emulsion layer on the support, wherein the silver halide emulsion layer contains at least one specific type of sensitizing dye, at least one of the silver halide emulsion layer and other hydrophilic colloid layers contains at least one compound of four specific types of compounds and the silver halide grains contained in the silver halide emulsion are substantially tetradecahedral grains in which the proportion of (100) faces is at least 50%; this material is superior in both sensitivity and stain resistance.

Abstract: A heat-developable photographic material comprising (a) an organic silver salt, (b) a photocatalyst, (c) a reducing agent, (d) a binder, and (e) at least one compound selected from the compound represented by the general formula (I) described below and the compound represented by the general formula (II) described below. ##STR1## wherein X represents a halogen atom; and R represents a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, an acyl group, a carbamoyl group, an alkylsulfonyl group, an arylsulfonyl group, an aralkylsulfonyl group or a heterocyclic residue, ##STR2## wherein X represents a halogen atom; Z represents a sulfur atom, an oxygen atom or >N--R.sub.1 (wherein R.sub.1 represents an alkyl group, an aryl group or an acyl group; (R')n represents a substituent present on the benzene nucleus; and n represents 0 or an integer from 1 to 4.

Abstract: A heat-developable photographic material is disclosed. The material is comprised of (a) an organic silver salt, (b) a photocatalyst, (c) a reducing agent, (d) a binder, and (e) at least one compound selected from the group consisting of 2-trihalogenomethyl-3,4-oxadiazoles and the derivatives thereof as an antifogging agent. The use of component (e) does not present environmental pollution problems and successfully reduces fog density.