Patents by Inventor Tadayuki Fujiwara
Tadayuki Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8580481Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.Type: GrantFiled: September 23, 2011Date of Patent: November 12, 2013Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi, Takeshi Iwai
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Publication number: 20120034561Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.Type: ApplicationFiled: September 23, 2011Publication date: February 9, 2012Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi, Takeshi Iwai
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Patent number: 8092979Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.Type: GrantFiled: July 1, 2009Date of Patent: January 10, 2012Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi, Takeshi Iwai
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Patent number: 7702486Abstract: A liquid crystal substrate managing apparatus comprises a data management section with a database for recording a defect information acquired from a liquid crystal testing device, and an image information and a repair information acquired from a liquid crystal repair device. The data management section performs the reidentification of a defect and/or the redetermination of a panel and/or a substrate based on the defect information, the image information and the repair information recorded in the database.Type: GrantFiled: February 20, 2004Date of Patent: April 20, 2010Assignee: Shimadzu CorporationInventors: Tadayuki Fujiwara, Chikuya Takada
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Publication number: 20090263743Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.Type: ApplicationFiled: July 1, 2009Publication date: October 22, 2009Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Hikaru MOMOSE, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi, Takeshi Iwai
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Patent number: 7575846Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.Type: GrantFiled: January 29, 2004Date of Patent: August 18, 2009Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi, Takeshi Iwai
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Patent number: 7339014Abstract: A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.Type: GrantFiled: October 28, 2004Date of Patent: March 4, 2008Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi
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Patent number: 7316884Abstract: A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1): wherein R1 represents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; R2 represents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or R1 and R2 represent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 carType: GrantFiled: October 22, 2002Date of Patent: January 8, 2008Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Ryuichi Ansai, Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Atsushi Ootake, Hikaru Momose
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Publication number: 20060127801Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.Type: ApplicationFiled: January 29, 2004Publication date: June 15, 2006Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Kayashi, Takeshi Iwai
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Patent number: 7041838Abstract: A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.Type: GrantFiled: December 5, 2001Date of Patent: May 9, 2006Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi
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Patent number: 6927011Abstract: A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II): wherein a substituent R3 represents an alkyl group, or a functional group comprising an acid-deprotectable protecting group, m representing the number of R3 is 0 (non-substitution), 1, 2 or more, R3 may be different from each other, provided that m is 2 or more, and n represents an integer of 0 to 4, has no rough spots on the surface after etching and so has good dry etching resistance, and therefore the resist resin is preferably used as a photo resist for DUV.Type: GrantFiled: February 9, 2001Date of Patent: August 9, 2005Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Yoshihiro Kamon, Hikaru Momose
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Publication number: 20050113538Abstract: The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition. wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—.Type: ApplicationFiled: October 28, 2004Publication date: May 26, 2005Applicant: Mitsubishi Rayon co.,Ltd.Inventors: Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi
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Patent number: 6887646Abstract: The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25° C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.Type: GrantFiled: July 11, 2000Date of Patent: May 3, 2005Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Masayuki Tooyama
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Patent number: 6844559Abstract: A substrate testing apparatus for testing a substrate by irradiation of electron beam comprises a scan parameter calculating unit, a stage control unit for controlling the movement of a stage, and an electron beam control unit for controlling an irradiating position of electron beam. The scan parameter calculating unit calculates a stage speed and the irradiating position of electron beam on the basis of an array of measurement points in a unit area set for each substrate species of object to be tested. The scan parameters for the substrate species are automatically calculated, and the driving of the testing apparatus is controlled in accordance with the calculated parameters, whereby it is unnecessary to restart the software.Type: GrantFiled: September 29, 2003Date of Patent: January 18, 2005Assignee: Shimadzu CorporationInventor: Tadayuki Fujiwara
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Publication number: 20040248031Abstract: The 5-methylene-1,3-dioxolan-4-one derivative of the present invention is represented by the formula (1) indicated below, and it is a novel monomer from which a homopolymer and a copolymer excellent in light transparency and heat stability are obtained. Moreover, the polymer obtained by (co)polymerizing a monomer composition comprising the derivative represented by the formula (1) indicated below is excellent in the resist performance such as sensitivity, resolution and dry etching resistance, and solubility in an organic solvent, also having little line edge roughness, and thus it is preferably used as a resin for a resist composition.Type: ApplicationFiled: April 22, 2004Publication date: December 9, 2004Inventors: Ryuichi Ansai, Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Atsushi Ootake, Hikayu Momose
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Publication number: 20040164762Abstract: A liquid crystal substrate managing apparatus comprises a data management section with a database for recording a defect information acquired from a liquid crystal testing device, and an image information and a repair information acquired from a liquid crystal repair device. The data management section performs the reidentification of a defect and/or the redetermination of a panel and/or a substrate based on the defect information, the image information and the repair information recorded in the database.Type: ApplicationFiled: February 20, 2004Publication date: August 26, 2004Applicant: SHIMADZU CORPORATIONInventors: Tadayuki Fujiwara, Chikuya Takada
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Publication number: 20040079897Abstract: A substrate testing apparatus for testing a substrate by irradiation of electron beam comprises a scan parameter calculating unit, a stage control unit for controlling the movement of a stage, and an electron beam control unit for controlling an irradiating position of electron beam. The scan parameter calculating unit calculates a stage speed and the irradiating position of electron beam on the basis of an array of measurement points in a unit area set for each substrate species of object to be tested. The scan parameters for the substrate species are automatically calculated, and the driving of the testing apparatus is controlled in accordance with the calculated parameters, whereby it is unnecessary to restart the software.Type: ApplicationFiled: September 29, 2003Publication date: April 29, 2004Applicant: SHIMADZU CORPORATIONInventor: Tadayuki Fujiwara
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Publication number: 20040063882Abstract: The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.Type: ApplicationFiled: June 5, 2003Publication date: April 1, 2004Inventors: Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi
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Patent number: 6706826Abstract: The present invention relates to a copolymer for use in paints, resists, and the like; a method for manufacturing the same; and a resist composition using the same. The copolymer according to the present invention is obtained by means of polymerizing at least one monomer containing an alicyclic structure and one monomer containing a lactone structure, and the distribution of the copolymer composition of said monomer containing a lactone structure in said copolymer is in the range of −10 to +10 mol % of the average copolymer composition of said monomer containing a lactone structure in said entire copolymer. In addition, the copolymer according to the present invention is obtained by means of polymerizing a monomer containing an alicyclic structure, a monomer containing a lactone structure, and another vinyl monomer comprising a higher polarity than said monomer containing an alicyclic structure, but a lower polarity than said monomer containing a lactone structure.Type: GrantFiled: September 27, 2000Date of Patent: March 16, 2004Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Tadayuki Fujiwara, Masayuki Tooyama, Yukiya Wakisaka, Koji Nishida, Akira Yanagase
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Patent number: 6630246Abstract: A photocuring sheet wherein a photocuring resin composition (A) comprising an acrylic resin with a photopolymerizable functional group on the side chains (a-1) and a photopolymerization initiator (a-2), is laminated on a transparent base sheet (B), photocuring decorative sheets and photocuring insert molding sheets employing it, and molded articles and a process for their manufacture, in which the sheets are used.Type: GrantFiled: September 5, 2000Date of Patent: October 7, 2003Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Akira Yanagase, Tadayuki Fujiwara, Yoko Kakuno, Yukiya Wakisaka