Patents by Inventor Tadayuki KAWAGUCHI

Tadayuki KAWAGUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrode structure, liquid crystal display device, projective display device, and method of manufacturing electrode structure
    Patent number: 11971633
    Abstract: An electrode structure includes: a plurality of pixel electrodes arranged separately from each other; and a plurality of dielectric layers laminated in a first direction with respect to the plurality of pixel electrodes, in which the plurality of dielectric layers includes: a first dielectric layer that spreads over the plurality of pixel electrodes in a direction intersecting with the first direction; and a second dielectric layer that includes dielectric material having a refractive index higher than that of the first dielectric layer, sandwiches the first dielectric layer together with the plurality of pixel electrodes, and has a slit at a position overlapping space between pixel electrodes adjacent when viewed from the first direction.
    Type: Grant
    Filed: May 15, 2020
    Date of Patent: April 30, 2024
    Assignees: SONY SEMICONDUCTOR SOLUTIONS CORPORATION, SONY GROUP CORPORATION
    Inventors: Takashi Sakairi, Tomoaki Honda, Tsuyoshi Okazaki, Keiichi Maeda, Chiho Araki, Katsunori Dai, Shunsuke Narui, Kunihiko Hikichi, Kouta Fukumoto, Toshiaki Okada, Takuma Matsuno, Yuu Kawaguchi, Yuuji Adachi, Koichi Amari, Hideki Kawaguchi, Seiya Haraguchi, Takayoshi Masaki, Takuya Fujino, Tadayuki Dofuku, Yosuke Takita, Kazuhiro Tamura, Atsushi Tanaka
  • Polyurethane urea resin composition exhibiting UV-absorption-agent resistance, moulded body using said composition, and coating material
    Patent number: 10428236
    Abstract: Provided is a polyurethane urea resin composition exhibiting UV absorption-agent resistance that achieves both durability and liquid resistance against UV absorption agents included in cosmetic products or the like, and that is capable of being used for a molded body and a coating material which exhibit excellent properties such as abrasion resistance, mar resistance, oleic acid resistance, water resistance, stain resistance, and weather resistance. The polyurethane urea resin composition exhibiting UV-absorption-agent resistance is obtained by reacting a polyol (A), a polyisocyanate (B), a molecular weight modifier (C), and a diamine (D), and can be used as a molded body and a member-coating material to impart durability and liquid resistance against UV absorption agents.
    Type: Grant
    Filed: July 6, 2015
    Date of Patent: October 1, 2019
    Assignee: TOSOH CORPORATION
    Inventors: Tadayuki Kawaguchi, Takahiro Tanaka
  • Synthetic resin skin material and method of manufacturing synthetic resin skin material
    Patent number: 10173404
    Abstract: A synthetic resin skin material includes, on one side of a base material 12, an adhesive layer 14, a skin layer 16, and a surface processing layer 18 in this order from the base material 12, the adhesive layer 14 and the skin layer 16 containing a polyurethane urea resin having a number average molecular weight of from 35,000 to 100,000.
    Type: Grant
    Filed: July 6, 2015
    Date of Patent: January 8, 2019
    Assignees: Kyowa Leather Cloth Co., Ltd., Tosoh Corporation
    Inventors: Takafumi Kinoshita, Takahito Nakamura, Tadayuki Kawaguchi
  • Synthetic Resin Skin Material and Method of Manufacturing Synthetic Resin Skin Material
    Publication number: 20170136749
    Abstract: A synthetic resin skin material includes, on one side of a base material 12, an adhesive layer 14, a skin layer 16, and a surface processing layer 18 in this order from the base material 12, the adhesive layer 14 and the skin layer 16 containing a polyurethane urea resin having a number average molecular weight of from 35,000 to 100,000.
    Type: Application
    Filed: July 6, 2015
    Publication date: May 18, 2017
    Applicants: Kyowa Leather Cloth Co., Ltd., TOSOH Corporation
    Inventors: Takafumi KINOSHITA, Takahito NAKAMURA, Tadayuki KAWAGUCHI
  • POLYURETHANE UREA RESIN COMPOSITION EXHIBITING UV-ABSORPTION-AGENT RESISTANCE, MOULDED BODY USING SAID COMPOSITION, AND COATING MATERIAL
    Publication number: 20170130094
    Abstract: Provided is a polyurethane urea resin composition exhibiting UV absorption-agent resistance that achieves both durability and liquid resistance against UV absorption agents included in cosmetic products or the like, and that is capable of being used for a moulded body and a coating material which exhibit excellent properties such as abrasion resistance, mar resistance, oleic acid resistance, water resistance, stain resistance, and weather resistance.
    Type: Application
    Filed: July 6, 2015
    Publication date: May 11, 2017
    Applicant: TOSOH CORPORATION
    Inventors: Tadayuki KAWAGUCHI, Takahiro TANAKA