Abstract: A substrate processing method is provided. The substrate processing method comprises loading a substrate onto a substrate support inside a chamber, forming a plasma inside the chamber, providing a first DC pulse signal to an electromagnet that generates a magnetic field inside the chamber and processing the substrate with the plasma, wherein the first DC pulse signal is repeated at a first period including a first section and a second section subsequent to the first section, the first DC pulse signal has a first level during the first section, and the first DC pulse signal has a second level different from the first level during the second section.

Abstract: Provided is a memory card that reinforces rigidity of a product, and increases the value of the product by improving the appearance of the product. The memory card includes a semiconductor chip; a case installed to surround the semiconductor chip; and a reinforcement member attached to one surface of the case so that rigidity of the case is increased. The surface of the case can be textured or marked by a variety of surface finishing techniques.