Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes supplying a liquid to a substrate; and heating the substrate after the supplying the liquid, and wherein the supplying the liquid includes: supplying a first liquid to the substrate; and supplying a second liquid which is different from the first liquid to a substrate to which the first liquid is supplied, and wherein the second liquid is supplied as a test to the substrate and a contact angle between the second liquid which is supplied and the substrate is measured to determine a degree of hydrophilization of the substrate, and a supply mechanism of the second liquid supplied to the substrate is determined based on the degree of hydrophilization of the substrate which is determined, before the supplying the second liquid is performed.

Abstract: Embodiments of the inventive concept provide a substrate treating apparatus and a substrate treating method for not letting an irradiation region of a laser deviate from a target region, even if a shaking angle of a chemical deviates from an allowable range due to a vibration or an airflow. The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes: a substrate support unit configured to support a substrate having a chemical coated thereon; a laser generation unit configured to irradiate a laser to the substrate; and a light-transmitter positioned along a path at which the laser is irradiated.

Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes pre-treating a substrate by cleaning the substrate; etching the substrate by supplying an etchant and heating a substrate supplied with the etchant; and post-treating the substrate after the etching the substrate, and wherein the pre-treating the substrate, the etching the substrate, and the post-treating the substrate are each performed in different chambers, a substrate on which the pre-treating the substrate is completed is transferred in a dry state to a chamber at which the etching the substrate is performed, and a substrate on which the etching the substrate is completed is transferred in a wetted state with a liquid to a chamber at which the post-treating the substrate is performed.

Abstract: Disclosed is a flame retardant polybutyleneterephthalate resin prepared be copolymerizing a phosphorus-based flame retardant represented by the following formula I and a butyleneterephthalate unit: wherein R1 and R2 are different or the same and are methyl or butyl including a hydroxyl group.

Abstract: Disclosed is a flame retardant polybutyleneterephthalate resin prepared by copolymerizing a phosphorus-based flame retardant represented by the following formula I and a butyleneterephthalate unit: 1

Abstract: The present invention relates to a process for the production of benzene derivatives represented by formula (I), which are useful as intermediates for agricultural chemicals, fine chemical products or pharmaceuticals such as anti inflammatory analgesics. The process includes reacting a compound of chemical formula (II) with a hydroformylating agent and a halogenating agent.