Patents by Inventor Tae H. Chung

Tae H. Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7995637
    Abstract: One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: August 9, 2011
    Assignee: Cymer, Inc.
    Inventors: Richard L. Sandstrom, William N. Partlo, Daniel J. W. Brown, Bryan G. Moosman, Tae H. Chung, Thomas P. Duffey, James J. Ferrell, Terance Hilsabeck
  • Publication number: 20100142582
    Abstract: One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
    Type: Application
    Filed: October 21, 2009
    Publication date: June 10, 2010
    Inventors: Richard L. Sandstrom, William N. Partlo, Daniel J. W. Brown, Bryan G. Moosman, Tae H. Chung, Thomas P. Duffey, James J. Ferrell, Terance Hilsabeck
  • Patent number: 7122816
    Abstract: An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having a droplet generator plasma source material reservoir in fluid communication with a droplet formation capillary and maintained within a selected range of temperatures sufficient to keep the plasma source material in a liquid form; a plasma source material supply system having a supply reservoir in fluid communication with the droplet generator plasma source material reservoir and holding at least a replenishing amount of plasma source material in liquid form for transfer to the droplet generator plasma source material reservoir, while the droplet generator is on line; a transfer mechanism transferring liquid plasma source material from the supply reservoir to the droplet generator plasma source material reservoir, while the droplet generator is on line.
    Type: Grant
    Filed: March 23, 2005
    Date of Patent: October 17, 2006
    Assignee: Cymer, Inc.
    Inventors: J. Martin Algots, Oscar Hemberg, Tae H. Chung
  • Patent number: 4159755
    Abstract: A safety hydraulic brake system for automotive vehicles which includes a control cylinder having an inlet connected to a hydraulic pressure source, and first and second outlets connected to brake cylinders at front and rear wheels, respectively. A valve is located at each outlet and normally allows pressurization of the front and rear wheel cylinders upon actuation of the hydraulic pressure source. First and second pistons, each having a by-pass valve, are slidable in the control cylinder. The pistons and by-pass valves are operable, when there is a loss of brake pressure in the lines to one set of brake cylinders, to effect closing of the control cylinder valve to that brake cylinder set. This allows brake pressure to be maintained at the other set of wheel cylinders and the vehicle to be safely braked.
    Type: Grant
    Filed: November 30, 1977
    Date of Patent: July 3, 1979
    Inventors: Byung K. Kang, Jin C. So, Tae H. Chung, Won Choi
  • Patent number: 3984490
    Abstract: A process is described for recovering phenylcyclohexane as principal product from dicyclohexylbenzenes by heating the latter in the presence of at least an equal amount by weight of benzene and an acid clay or zeolite catalyst at a temperature of 190.degree. - 400.degree.C. The period of heating is preferably controlled so that no significant cracking of the phenylcyclohexane is caused. The process is a useful adjunct to the known methods of production of phenylcyclohexane by hydrodimerization by benzene. The latter process gives significant amounts of dicyclohexylbenzenes as by-product. The present process enables this generally undesirable by-product to be converted to phenylcyclohexane thus increasing the overall yield of phenylcyclohexane from benzene in the hydrodimerization process.
    Type: Grant
    Filed: May 8, 1975
    Date of Patent: October 5, 1976
    Assignee: The Upjohn Company
    Inventors: Tae H. Chung, Chandrakant A. Patel, Adnan A. R. Sayigh