Abstract: A technique for extending a model of a semantic web application based on a model of a linked data set is provided. At least one linked data set related to the model of the semantic web application may be searched for, a model of the linked data set may be extracted, and information from the model of the linked data set may be added to the model of the semantic web application.

Abstract: A method for managing states by a Media Access Control (MAC) layer in a wireless network is disclosed. The method includes determining next occurable physical interrupts for each of the states; configuring a link of the states according to the determination result; transitioning to a state to be linked next if a physical interrupt occurs in each state; and transitioning to an initial state if an timer interrupt occurs in each state. The MAC layer transitions to the initial state if a physical interrupt occurs in a last state among the linked states. The physical interrupt occurs in association with a physical event, and the timer interrupt occurs in association with a timer event.

Abstract: A mobile communication terminal to provide a widget expansion function using a message communication, and an operation method of the mobile communication terminal is provided. The method includes a configuration of generating an additional function expansion message based on expansion of an additional function of a widget, and transmitting the generated additional function expansion message. The method also includes a configuration of expanding the additional function of the widget by receiving the additional function expansion message, by determining an application programming interface (API) library with respect to the expansion of the additional function, and by calling the determined API library.

Abstract: A context-aware information obtaining method and apparatus uses local service information. A communication apparatus may receive local service information associated with a location of the communication apparatus. The communication apparatus may interpret the local service information to generate context-aware information of the communication apparatus.

Abstract: A system for managing a queue order may receive queue order registration requests from a plurality of user terminals, generate queue order information of the plurality of user terminals, and broadcast, when the queue order information changes, notification information about the change of the queue order information.

Abstract: A method for managing states by a Media Access Control (MAC) layer in a wireless network is disclosed. The method includes determining next occurable physical interrupts for each of the states; configuring a link of the states according to the determination result; transitioning to a state to be linked next if a physical interrupt occurs in each state; and transitioning to an initial state if an timer interrupt occurs in each state. The MAC layer transitions to the initial state if a physical interrupt occurs in a last state among the linked states. The physical interrupt occurs in association with a physical event, and the timer interrupt occurs in association with a timer event.

Abstract: A silicon-on-insulator (SOI) substrate includes a silicon substrate including an active region defined by a field region that surrounds the active region for device isolation. The field region includes a first oxygen-ion-injected isolation region and a second oxygen-ion-injected isolation region. The first oxygen-ion-injected isolation region has a first thickness and is disposed under the active region, a center of the first oxygen-ion-injected isolation region being at a first depth from a top surface of the silicon substrate. The second oxygen-ion-injected isolation region has a second thickness that is greater than the first thickness, the second oxygen-ion-injected isolation region disposed at sides of the active region and formed from a ton surface of the silicon substrate, a center of the second oxygen-ion-injected region disposed at a second depth from the top surface of the silicon substrate.

Abstract: A hardware device for executing conditional instructions out-of-order and the execution method. An architecture is provided, enabling the hardware device such as a processor supporting the conditional instruction and a computer system to execute the instruction out-of-order. To this end, a conditional execution buffer is provided, and a register of a destination operand of the conditional instruction is renamed to another register. Hence, the hardware device using the conditional instruction can carry out the out-of-order execution, and the execution speed of the hardware device can be greatly improved.

Abstract: An ion implanting system and a wafer holding apparatus therefor are provided. The ion implanting system includes x- and y-axis rotating parts; first and second angle measuring circuits; and a controller. The x-axis rotating part rotates a main surface of a wafer about an x-axis, and the y-axis rotating part rotates the main surface of the wafer about a y-axis. The first angle measuring circuit is rotated along with the main surface of the wafer and measures a tilt angle of the main surface of the wafer with respect to the x-axis. The second angle measuring means is rotated along with the main surface of the wafer and measures a rotating angle of the main surface of the wafer with respect to the y-axis. The controlling part, when the measured tilt angles are different from target tilt angles, controls the x- and y-axis rotating parts such that the measured tilt angles are equal to the target tilt angles.

Abstract: Disclosed are an SOI substrate and a method for manufacturing the same. The SOI substrate comprises a silicon substrate including an active region defined by a field region. The field region includes a first oxygen-ion-injected isolation region having a first thickness and being formed under the active region. The center of the first region is at a first depth from a top surface of the silicon substrate. The field region of the SOI substrate further includes a second oxygen-ion-injected region having a second thickness greater than the first thickness. The second region is formed at sides of the active region and is also formed from a top surface of the silicon substrate. The center of the second ion injected region is at a second depth from the top surface of the silicon substrate. The first and second ion injected regions surround the active region for device isolation. The SOI substrate is formed by implementing two sequential ion injecting processes.

Abstract: Disclosed are an SOI substrate and a method for manufacturing the same. The SOI substrate comprises a silicon substrate including an active region defined by a field region. The field region includes a first oxygen-ion-injected isolation region having a first thickness and being formed under the active region. The center of the first region is at a first depth from a top surface of the silicon substrate. The field region of the SOI substrate further includes a second oxygen-ion-injected region having a second thickness greater than the first thickness. The second region is formed at sides of the active region and is also formed from a top surface of the silicon substrate. The center of the second ion injected region is at a second depth from the top surface of the silicon substrate. The first and second ion injected regions surround the active region for device isolation. The SOI substrate is formed by implementing two sequential ion injecting processes.

Abstract: An ion implanting system and a wafer holding apparatus therefor are provided. The ion implanting system includes x- and y-axis rotating parts; first and second angle measuring circuits; and a controller. The x-axis rotating part rotates a main surface of a wafer about an x-axis, and the y-axis rotating part rotates the main surface of the wafer about a y-axis. The first angle measuring circuit is rotated along with the main surface of the wafer and measures a tilt angle of the main surface of the wafer with respect to the x-axis. The second angle measuring means is rotated along with the main surface of the wafer and measures a rotating angle of the main surface of the wafer with respect to the y-axis. The controlling part, when the measured tilt angles are different from target tilt angles, controls the x- and y-axis rotating parts such that the measured tilt angles are equal to the target tilt angles.

Abstract: An exposing method comprises use of different kinds of aligning and exposing apparatuses having different alignment and exposure characteristics. Capability to select a suitable aligning and exposing apparatus for each layer to be formed is accomplished by manufacturing a mask used for the exposure to be compatible with different kinds of aligning and exposing apparatuses.

Abstract: Disclosed are an SOI substrate and a method for manufacturing the same. The SOI substrate comprises a silicon substrate including an active region defined by a field region. The field region includes a first oxygen-ion-injected isolation region having a first thickness and being formed under the active region. The center of the first region is at a first depth from a top surface of the silicon substrate. The field region of the SOI substrate further includes a second oxygen-ion-injected region having a second thickness greater than the first thickness. The second region is formed at sides of the active region and is also formed from a top surface of the silicon substrate. The center of the second ion injected region is at a second depth from the top surface of the silicon substrate. The first and second ion injected regions surround the active region for device isolation. The SOI substrate is formed by implementing two sequential ion injecting processes.

Abstract: An exposing method comprises use of different kinds of aligning and exposing apparatuses having different alignment and exposure characteristics. Capability to select a suitable aligning and exposing apparatus for each layer to be formed is accomplished by manufacturing a mask used for the exposure to be compatible with different kinds of aligning and exposing apparatuses.

Abstract: An exposing method comprises use of different kinds of aligning and exposing apparatuses having different alignment and exposure characteristics. Capability to select a suitable aligning and exposing apparatus for each layer to be formed is accomplished by manufacturing a mask used for the exposure to be compatible with different kinds of aligning and exposing apparatuses.