Patents by Inventor TAEHONG GWON

TAEHONG GWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9214630
    Abstract: Described herein is a method and precursor composition for depositing a multicomponent film. In one embodiment, the method and composition described herein is used to deposit a germanium-containing film such as Germanium Tellurium, Antimony Germanium, and Germanium Antimony Tellurium (GST) films via an atomic layer deposition (ALD) and/or other germanium, tellurium and selenium based metal compounds for phase change memory and photovoltaic devices. In this or other embodiments, the Ge precursor used comprises trichlorogermane.
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: December 15, 2015
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Manchao Xiao, Iain Buchanan, Moo-Sung Kim, Sergei Vladimirovich Ivanov, Xinjian Lei, Cheol Seong Hwang, Taehong Gwon
  • Publication number: 20140308802
    Abstract: Described herein is a method and precursor composition for depositing a multicomponent film. In one embodiment, the method and composition described herein is used to deposit a germanium-containing film such as Germanium Tellurium, Antimony Germanium, and Germanium Antimony Tellurium (GST) films via an atomic layer deposition (ALD) and/or other germanium, tellurium and selenium based metal compounds for phase change memory and photovoltaic devices. In this or other embodiments, the Ge precursor used comprises trichlorogermane.
    Type: Application
    Filed: April 4, 2014
    Publication date: October 16, 2014
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Manchao Xiao, Iain Buchanan, MOO-SUNG KIM, Sergei Vladimirovich Ivanov, Xinjian Lei, Cheol Seong Hwang, TAEHONG GWON