Abstract: A method of forming the alignment film includes placing an inorganic target and a substrate in a chamber so that the inorganic target and the substrate are parallel to each other, evacuating the chamber to a first pressure, supplying a discharge gas into the chamber and evacuating the chamber to a second pressure higher than the first pressure. Moreover, the method further includes depositing an inorganic film on the substrate by ejecting inorganic particles from the inorganic target.

Abstract: The invention relates to a fabrication of an integrated optical isolator using a Multi-Mode Interference (MMI) structure and a cladding layer comprising magneto-optical material, which remove needless reflection generated in the course of light propagation and make short length integration possible. Thus, the invention uses nonreciprocal phase shift effect that optical characteristics are altered according to the direction of light propagation. In order to fabricate a light waveguide optical isolator, an input light should be separated into two light waveguides having the same power. That is, for the purpose of reducing the length of optical isolator device, the waveguide length needed to separate an input light into two light waveguides should be shortened. Since the light waveguide length of MMI structure is much shorter than the length of Mach-Zehnder light waveguide for separating an input light into two waveguides, the length of optical isolator device using MMI structure can be reduced.