Patents by Inventor Tae Ji

Tae Ji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070010090
    Abstract: A semiconductor device having a local interconnection layer and a method for manufacturing the same are provided. A local interconnection layer is formed in an interlayer dielectric (ILD) layer on an isolation layer and a junction layer, for covering a semiconductor substrate, the isolation layer, and a gate pattern. An etch stopper pattern having at least one layer for preventing the etching of the isolation layer is formed under the local interconnection layer. The etch stopper pattern having at least one layer for preventing the etching of the isolation layer can be included when forming the local interconnection layer, thereby preventing leakage current caused by the etching of the isolation layer, improving the electrical characteristics of a semiconductor device, and improving the yield of a process of manufacturing a semiconductor device.
    Type: Application
    Filed: September 7, 2006
    Publication date: January 11, 2007
    Inventors: Dong-kyun Nam, Heon-jong Shin, Hyung tae Ji
  • Patent number: 7122850
    Abstract: A semiconductor device having a local interconnection layer and a method for manufacturing the same are provided. A local interconnection layer is formed in an interlayer dielectric (ILD) layer on an isolation layer and a junction layer, for covering a semiconductor substrate, the isolation layer, and a gate pattern. An etch stopper pattern having at least one layer for preventing the etching of the isolation layer is formed under the local interconnection layer. The etch stopper pattern having at least one layer for preventing the etching of the isolation layer can be included when forming the local interconnection layer, thereby preventing leakage current caused by the etching of the isolation layer, improving the electrical characteristics of a semiconductor device, and improving the yield of a process of manufacturing a semiconductor device.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: October 17, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-kyun Nam, Heon-jong Shin, Hyung-tae Ji
  • Publication number: 20050148505
    Abstract: Methods of regulating gene expression through exposure of the gene to follicle stimulating hormone are provided. Follicle stimulating hormone is used to suppress the expression of T3-binding protein mRNA and thereby regulate ovulation, estrogen production and steroidogenesis.
    Type: Application
    Filed: December 17, 2003
    Publication date: July 7, 2005
    Inventors: Tae Ji, Inhae Ji
  • Publication number: 20050142135
    Abstract: The present invention relates to agents and methods for the modulation of gonadotropin hormones and their receptors, including methods of treating gonadotropin disorders and conditions and screening and development of therapies. Specifically, the present invention relates to modulation of gonadotropin hormones through the inhibition of activity of exoloop 1, exoloop 2 and exoloop 3 of gonadotropin receptors.
    Type: Application
    Filed: April 12, 2004
    Publication date: June 30, 2005
    Applicant: University of Kentucky Research Foundation
    Inventors: Tae Ji, Inhae Ji
  • Publication number: 20030049936
    Abstract: A semiconductor device having a local interconnection layer and a method for manufacturing the same are provided. A local interconnection layer is formed in an interlayer dielectric (ILD) layer on an isolation layer and a junction layer, for covering a semiconductor substrate, the isolation layer, and a gate pattern. An etch stopper pattern having at least one layer for preventing the etching of the isolation layer is formed under the local interconnection layer. The etch stopper pattern having at least one layer for preventing the etching of the isolation layer can be included when forming the local interconnection layer, thereby preventing leakage current caused by the etching of the isolation layer, improving the electrical characteristics of a semiconductor device, and improving the yield of a process of manufacturing a semiconductor device.
    Type: Application
    Filed: August 30, 2002
    Publication date: March 13, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Dong-Kyun Nam, Heon-Jong Shin, Hyung-Tae Ji
  • Patent number: 5693491
    Abstract: The cDNA that encodes a glycoprotein receptor from the tobacco hornworm which binds a Bacillus thuringiensis toxin has been obtained and sequenced. The availability of this cDNA permits the retrieval of DNAs encoding homologous receptors in other insects and organisms as well as the design of assays for the cytotoxicity and binding affinity of potential pesticides and the development of methods to manipulate natural and/or introduced homologous receptors and, thus, to destroy target cells, tissues and/or organisms.
    Type: Grant
    Filed: October 19, 1994
    Date of Patent: December 2, 1997
    Assignee: University of Wyoming
    Inventors: Lee A. Bulla, Tae Ji