Patents by Inventor Tae-Kyong Hwang

Tae-Kyong Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100326599
    Abstract: Disclosed is an integrated vacuum producing apparatus, which vacuumizes a process chamber of an apparatus for manufacturing semiconductors, flat panel displays, etc. or exhausts gaseous material and by-products generated within the process chamber to an outside so as to purify it. Gaseous material, e.g. gas, generated within a chamber for manufacturing a semiconductor, a flat panel display, etc. is exhausted through each separate exhaust line so as to be purified. Therefore, excessive operation of a purifying system can be prevented through distribution of exhaust gas so that life span can be extended according to the operation of the apparatus. Also, exhausting can be smoothly achieved through each exhaust line so that it is possible to prevent delay of a semi-conductor manufacturing process due to inability of exhausting, and to easily remove non-reacted gas and by-products in an exhausting process.
    Type: Application
    Filed: May 16, 2008
    Publication date: December 30, 2010
    Inventors: Tae-Kyong Hwang, Heaung-Shig Oh, Myung-Keun Noh
  • Patent number: 7611340
    Abstract: A complex dry vacuum pump including a root rotor and a screw rotor is disclosed for manufacturing semiconductors and/or displays in a vacuum state in a process chamber, and discharging gaseous material and/or by-products generated during manufacturing to the exterior of the process chamber. The pump can provide high gas compression transfer efficiency so as to form a vacuum in the process chamber and/or keep high gas compression transfer efficiency when the gaseous material and/or by-products are discharged. Balance between the root rotor and the screw rotor can prevent vibration and noise generated in the vacuum pump, and molding material associated with the pump may allow a stator coil to be separated and prevent various by-products from flowing from the vacuum pump.
    Type: Grant
    Filed: July 26, 2007
    Date of Patent: November 3, 2009
    Assignee: LOT Vacuum Co., Ltd.
    Inventors: Tae-Kyong Hwang, Myung Keun Noh, Heaung Shig Oh
  • Publication number: 20080025858
    Abstract: A complex dry vacuum pump including a root rotor and a screw rotor is disclosed for manufacturing semiconductors and/or displays in a vacuum state in a process chamber, and discharging gaseous material and/or by-products generated during manufacturing to the exterior of the process chamber. The pump can provide high gas compression transfer efficiency so as to form a vacuum in the process chamber and/or keep high gas compression transfer efficiency when the gaseous material and/or by-products are discharged. Balance between the root rotor and the screw rotor can prevent vibration and noise generated in the vacuum pump, and molding material associated with the pump may allow a stator coil to be separated and prevent various by-products from flowing from the vacuum pump.
    Type: Application
    Filed: July 26, 2007
    Publication date: January 31, 2008
    Applicant: LOT Vacuum Co., Ltd.
    Inventors: Tae-Kyong Hwang, Myung Noh, Heaung Oh